The DOI matches its Crossref record; 58 of the 58 references it cites were found in a registry or an index.
Pushing multiple patterning in sub-10nm: are we ready?
Abstract
Due to elongated delay of extreme ultraviolet lithography (EUVL), the semiconductor industry has been pushing the 193nm immersion lithopgrahy using multiple patterning to print critical features in 22nm/14nm technology nodes and beyond. Multiple patterning lithography (MPL) poses many new challenges to both mask design and IC physical design. The mask layout decomposition problem has been extensively studied, first on double patterning, then on triple or even quadruple patterning. Meanwhile, many studies have shown that it is very important to consider MPL implications at early physical design stages so that the overall design and manufacturing closure can be reached. In this paper, we provide a comprehensive overview on the state-of-the-art research results for MPL, from synergistic mask synthesis to physical design. We will also discuss the open problems as to pushing multiple patterning in sub-10nm.
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Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149
Metadata
- Authors
- Pan, D. Z., Liebmann, L., Yu, B., Xu, X., & Lin, Y.
- Affiliations
- The University of Texas at Austin (US)
- IBM (United States) (US)
- Venue
- Proceedings of the 52nd Annual Design Automation Conference
- Publisher
- ACM
- Published
- 2015-06-07
- Pages
- 1-6
- ISSN
- 0738-100X (ISSN-L)
- OpenAlex
- W1996055445
- Cited by
- 38
- References
- 58
- Citations by year
- 2026: 4 · 2025: 3 · 2024: 4 · 2023: 2 · 2022: 1 · 2021: 1 · 2020: 4 · 2019: 1 · 2018: 4 · 2017: 11 · 2016: 3
- FWCI
- 7.43
- Type
- conference paper
- Language
- en
- Open access
- closed
- Locations
- ACM/IEEE Design Automation Conference (DAC) (publishedVersion)
- Funders
- National Science Foundation
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Engineering › Electrical and Electronic Engineering › VLSI and FPGA Design Techniques
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Low-power high-performance VLSI design
- Keywords
- 193 nm immersion lithography, mask synthesis, physical design, double patterning, design for manufacturing, design closure
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