Cited by 33Optical Coatings and GratingsAdvanced Materials and Semiconductor TechnologiesTransition Metal Oxide Nanomaterials

Effects of annealing on the optical, structural, and chemical properties of TiO_2 and MgF_2 thin films prepared by plasma ion-assisted deposition

Woo, Seouk-Hoon, Hwangbo, Chang Kwon·2006·Applied Optics

Abstract

Effects of thermal annealing at 400 degrees C on the optical, structural, and chemical properties of TiO2 single-layer, MgF2 single-layer, and TiO2/MgF2 narrow-bandpass filters deposited by conventional electron-beam evaporation (CE) and plasma ion-assisted deposition (PIAD) were investigated. In the case of TiO2 films, the results show that the annealing of both CE and PIAD TiO2 films increases the refractive index slightly and the extinction coefficient and surface roughness greatly. Annealing decreases the thickness of CE TiO2 films drastically, whereas it does not vary that of PIAD TiO2 films. For PIAD MgF2 films, annealing increases the refractive index and decreases the extinction coefficient drastically. An x-ray photoelectron spectroscopy analysis suggests that an increase in the refractive index and a decrease in the extinction coefficient for PIAD MgF2 films after annealing may be related to the enhanced concentration of MgO in the annealed PIAD MgF2 films and the changes in the chemical bonding states of Mg 2p, F 1s, and O is. It is found that (TiO2/MgF2) multilayer filters, consisting of PIAD TiO2 and CE MgF2 films, are as deposited without microcracks and are also thermally stable after annealing.

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Crossref · 10.1364/ao.45.001447

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  • PIAD leads to a higher refractive index n and lower extinction coefficient k than conventional evaporation, confirming the densification effect of ion bombardment.

    “Classical studies show that PIAD leads to a higher n and lower k than conventional evaporation, confirming the densification effect of ion bombardment [62].”

    From Metal Oxide Thin Films for Advanced Photonic Applications (2026) · cites this paper as [62]

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Authors
Woo, S.-H., & Hwangbo, C. K.
Affiliations
Inha University (KR)
Venue
Applied Optics
Published
2006-03-01
Volume
45
Issue
7
Pages
1447
ISSN
  • 0003-6935 (ISSN-L)
  • 1539-4522
OpenAlex
W2157207305
Cited by
33
References
18
Citations by year
2025: 2 · 2024: 3 · 2023: 4 · 2022: 1 · 2021: 2 · 2020: 5 · 2019: 3 · 2016: 1 · 2015: 1 · 2014: 1 · 2013: 3
FWCI
1.18
Type
journal article
Language
en
Open access
closed
Locations
  • Applied Optics (publishedVersion)
  • PubMed (publishedVersion)
Topics
  • Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
  • Physical Sciences › Materials Science › Materials Chemistry › Advanced Materials and Semiconductor Technologies
  • Physical Sciences › Materials Science › Polymers and Plastics › Transition Metal Oxide Nanomaterials
Keywords
annealing, TiO2 thin films, MgF2 thin films, plasma ion assisted deposition, electron beam evaporation, narrow bandpass filters, refractive index, extinction coefficient, surface roughness, MgO formation, chemical bonding states, multilayer optical filters, thermal stability, microcracks

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