High Reflectivity, Compact, and Widely Tunable Distributed Bragg Reflector Based on Silicon-Rich SiNx-SiOy at 80 °C PECVD
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This study investigates the mechanical and optical characteristics of silicon nitride thin films deposited with PECVD at 80 °C for tunable silicon-rich SiNx-SiOy-based MEMS optical cavities. Varying the deposition parameters using SiH4 and N2 as precursor gases for silicon-rich SiNx thin films allows us to tune the refractive index to a value as high as 2.40 ± 0.013 at an extinction coefficient of only 0.008, an extremely low surface roughness of only 0.26 nm, and a compressive stress of about 150 MPa. We deposited 6.5-layer pairs of silicon-rich SiNx/SiOy-distributed Bragg reflector (DBR) micro-electro-mechanical system (MEMS) mirror that covers the whole 1300 and 1550 nm range. Cavity architectures of 6.5 top and 6 bottom layer-pairs were fabricated in the clean room providing a variety of cavity lengths between 0.615 µm and 2.85 µm. These lengths were then simulated in order to estimate the Young’s Modulus of silicon-rich SiNx, obtaining values from 56 to 92 GPa. One of the designs was characterised electro-thermally providing a tuning range of at least 86.7 nm centred at 1585 nm. The tunable filters are well suitable for implementation as tuning element in lasers for optical coherence tomography.
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Dielectric thin films are better suited than metallic coatings for applications where metallic counterparts fail, owing to low optical losses (reflectivity over 99.9%), angular and spectral engineering, superior laser-induced damage threshold, and superior mechanical and chemical stability.
“However, a robust way to overcome these limitations is to use dielectric thin films. Known also as optical interference coatings [11], dielectric ones are better suited for applications where metallic counterparts fail. This advantage comes from their specific properties, such as low optical losses that result in a reflectivity of over 99.9%, angular and spectral engineering through alternating”
From Metal Oxide Thin Films for Advanced Photonic Applications (2026) · cites this paper as [14]
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Metal Oxide Thin Films for Advanced Photonic Applications
Stîngescu, M.-L., Șopronyi, M.-A., Antohe, Ș., & Scărișoreanu, N.-D. (2026) · Crystals · doi:10.3390/cryst16030164 · Cited by 2 · see citing works
- Authors
- Rodríguez Lamoso, I., & Preu, S.
- Affiliations
- Terahertz Devices and Systems, Technical University of Darmstadt; Merckstrasse 25, 64283 Darmstadt, Germany
- Technische Universität Darmstadt (DE)
- ORCID
- Preu, Sascha
- Venue
- Applied Sciences
- Publisher
- MDPI AG
- Published
- 2025-03-18
- Volume
- 15
- Issue
- 6
- Pages
- 3330
- ISSN
- 2076-3417 (ISSN-L)
- OpenAlex
- W4408571170
- Cited by
- 1
- References
- 29
- Citations by year
- 2025: 1
- FWCI
- 0.23
- Type
- journal article
- Language
- en
- Open access
- gold
- doi.org
- Licence
- Locations
- Applied Sciences (publishedVersion, cc-by)
- Preprints.org (acceptedVersion, cc-by)
- DOAJ (DOAJ: Directory of Open Access Journals) (submittedVersion, cc-by-sa)
- Funders
- Marie-Curie-Sklodowska Actions ITN “NETLAS” (GA 860807)
- Open Access Fund of the German Research Foundation through TU Darmstadt (GA 860807)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced MEMS and NEMS Technologies
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Photonic and Optical Devices
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
- Keywords
- distributed Bragg reflector, silicon-rich silicon nitride, tunable optical filter, low-temperature PECVD, refractive index tuning, compressive stress, surface roughness, Young's modulus, MEMS mirror
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