The DOI matches its Crossref record; 104 of the 104 references it cites were found in a registry or an index.
Toward Mass Production of CVD Graphene Films
Abstract
Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large‐area and high‐quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain sizes, uniform layers, fast growth, and low synthesis temperatures. Some attempts have been made by both the scientific community and startup companies to mass produce graphene films; however, there is a large difference in the quality of graphene synthesized on a laboratory scale and an industrial scale. Here, recent progress toward the mass production of CVD graphene films is summarized, including the manufacturing process, equipment, and critical process parameters. Moreover, the large‐scale homogeneity of graphene films and fast characterization methods are also discussed, which are crucial for quality control in mass production.
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Cites
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Chemical Vapour Deposition of Graphene—Synthesis, Characterisation, and Applications: A Review
Saeed, M., Alshammari, Y., Majeed, S. A., & Al-Nasrallah, E. (2020) · Molecules · doi:10.3390/molecules25173856 · Cited by 459
Age of Flexible Electronics: Emerging Trends in Soft Multifunctional Sensors
Lee, J., Cho, K., & Kim, J. (2024) · Advanced Materials · doi:10.1002/adma.202310505 · Cited by 355
Shen, X., Zheng, Q., & Kim, J.-K. (2021) · Progress in Materials Science · doi:10.1016/j.pmatsci.2020.100708 · Cited by 264
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Metadata
- Authors
- Deng, B., Liu, Z., & Peng, H.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2018-09-16
- Volume
- 31
- Issue
- 9
- Pages
- e1800996-e1800996
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W2891079615
- Cited by
- 408
- References
- 104
- FWCI
- 10.48
- Type
- journal article
- Language
- en
- Open access
- closed
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