The DOI matches its Crossref record; 20 of the 20 references it cites were found in a registry or an index.
Defect-Free Nanoporous Thin Films from ABC Triblock Copolymers
Abstract
The self-assembly of triblock copolymers of poly(ethylene oxide-b-methyl methacrylate-b-styrene) (PEO-b-PMMA-b-PS), where PS is the major component and PMMA and PEO are minor components, provides a robust route to highly ordered, nanoporous arrays with cylindrical pores of 10-15 nm that show promise in block copolymer lithography. These ABC triblock copolymers were synthesized by controlled living radical polymerization, and after solvent annealing, thin films showing defect-free cylindrical microdomains were obtained. The key to the successful generation of highly regular, porous thin films is the use of PMMA as a photodegradable mid-block which leads to nanoporous structures with an unprecedented degree of lateral order. The power of using a triblock copolymer when compared to a traditional diblock copolymer is evidenced by the ability to exploit and combine the advantages of two separate diblock copolymer systems, the high degree of lateral ordering inherent in PS-b-PEO diblocks plus the facile degradability of PS-b-PMMA diblock copolymer systems, while negating the corresponding disadvantages, poor degradability in PS-b-PEO systems and no long-range order for PS-b-PMMA diblocks.
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Cites
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Cited by
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Metadata
- Authors
- Bang, J., Kim, S. H., Drockenmuller, E., Misner, M. J., Russell, T. P., & Hawker, C. J.
- Venue
- Journal of the American Chemical Society
- Publisher
- American Chemical Society (ACS)
- Published
- 2006-05-19
- Volume
- 128
- Issue
- 23
- Pages
- 7622-7629
- ISSN
- 0002-7863 (ISSN-L)
- 1520-5126
- OpenAlex
- W1985633457
- Cited by
- 302
- References
- 20
- FWCI
- 18.88
- Type
- journal article
- Language
- en
- Open access
- closed
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