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Cited by 322

The DOI matches its Crossref record; 2 of the 2 references it cites were found in a registry or an index.

Direct Formation of Wafer Scale Graphene Thin Layers on Insulating Substrates by Chemical Vapor Deposition

Su, Ching-Yuan, Lu, Ang-Yu, Wu, Chih-Yu, Li, Yi-Te, Liu, Keng-Ku, Zhang, Wenjing, Lin, Shi-Yen, Juang, Zheng-Yu, Zhong, Yuan-Liang, Chen, Fu-Rong, Li, Lain-Jong·2011·Nano Letters

Abstract

Direct formation of high-quality and wafer scale graphene thin layers on insulating gate dielectrics such as SiO(2) is emergent for graphene electronics using Si-wafer compatible fabrication. Here, we report that in a chemical vapor deposition process the carbon species dissociated on Cu surfaces not only result in graphene layers on top of the catalytic Cu thin films but also diffuse through Cu grain boundaries to the interface between Cu and underlying dielectrics. Optimization of the process parameters leads to a continuous and large-area graphene thin layers directly formed on top of the dielectrics. The bottom-gated transistor characteristics for the graphene films have shown quite comparable carrier mobility compared to the top-layer graphene. The proposed method allows us to achieve wafer-sized graphene on versatile insulating substrates without the need of graphene transfer.

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Crossref · 10.1021/nl201362n

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Metadata

Authors
Su, C.-Y., Lu, A.-Y., Wu, C.-Y., Li, Y.-T., Liu, K.-K., Zhang, W., Lin, S.-Y., Juang, Z.-Y., Zhong, Y.-L., Chen, F.-R., & Li, L.-J.
Venue
Nano Letters
Published
2011-08-15
Volume
11
Issue
9
Pages
3612-3616
ISSN
  • 1530-6984 (ISSN-L)
  • 1530-6992
OpenAlex
W2019126372
Cited by
322
References
2
FWCI
15.96
Type
journal article
Language
en
Open access
closed

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