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Effects of Polycrystalline Cu Substrate on Graphene Growth by Chemical Vapor Deposition
Abstract
Chemical vapor deposition of graphene on Cu often employs polycrystalline Cu substrates with diverse facets, grain boundaries (GBs), annealing twins, and rough sites. Using scanning electron microscopy (SEM), electron-backscatter diffraction (EBSD), and Raman spectroscopy on graphene and Cu, we find that Cu substrate crystallography affects graphene growth more than facet roughness. We determine that (111) containing facets produce pristine monolayer graphene with higher growth rate than (100) containing facets, especially Cu(100). The number of graphene defects and nucleation sites appears Cu facet invariant at growth temperatures above 900 °C. Engineering Cu to have (111) surfaces will cause monolayer, uniform graphene growth.
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Metadata
- Authors
- Wood, J. D., Schmucker, S. W., Lyons, A. S., Pop, E., & Lyding, J. W.
- Venue
- Nano Letters
- Publisher
- American Chemical Society (ACS)
- Published
- 2011-10-04
- Volume
- 11
- Issue
- 11
- Pages
- 4547-4554
- ISSN
- 1530-6984 (ISSN-L)
- 1530-6992
- OpenAlex
- W2329587901
- Cited by
- 470
- References
- 41
- FWCI
- 22.00
- Type
- journal article
- Language
- en
- Open access
- closed
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