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Channel Length Scaling of MoS2 MOSFETs

Open access
Liu, Han, Neal, Adam T., Ye, Peide D.·2012·ACS Nano

Abstract

In this article, we investigate electrical transport properties in ultrathin body (UTB) MoS(2) two-dimensional (2D) crystals with channel lengths ranging from 2 μm down to 50 nm. We compare the short channel behavior of sets of MOSFETs with various channel thickness, and reveal the superior immunity to short channel effects of MoS(2) transistors. We observe no obvious short channel effects on the device with 100 nm channel length (L(ch)) fabricated on a 5 nm thick MoS(2) 2D crystal even when using 300 nm thick SiO(2) as gate dielectric, and has a current on/off ratio up to ~10(9). We also observe the on-current saturation at short channel devices with continuous scaling due to the carrier velocity saturation. Also, we reveal the performance limit of short channel MoS(2) transistors is dominated by the large contact resistance from the Schottky barrier between Ni and MoS(2) interface, where a fully transparent contact is needed to achieve a high-performance short channel device.

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Metadata

Authors
Liu, H., Neal, A. T., & Ye, P. D.
Venue
ACS Nano
Published
2012-09-12
Volume
6
Issue
10
Pages
8563-8569
ISSN
  • 1936-0851 (ISSN-L)
  • 1936-086X
OpenAlex
W1993916317
Cited by
816
References
7
FWCI
28.24
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: Channel Length Scaling of MoS2 MOSFETs. https://app.cochat.ai/papers/10.1021/nn303513c
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Liu, H., Neal, A. T., & Ye, P. D. (2012). Channel Length Scaling of MoS2 MOSFETs. ACS Nano. https://doi.org/10.1021/nn303513c

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