Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications

X-Rays and Extreme Ultraviolet Radiation

Attwood, D. T., & Sakdinawat, A. E. (2016) · Cambridge University Press eBooks · doi:10.1017/cbo9781107477629 · Cited by 751 · see citing works

Lithography gets extreme

Wagner, C., & Harned, N. (2010) · Nature Photonics · doi:10.1038/nphoton.2009.251 · Cited by 650 · see citing works

LXXVI. Facts relating to optical science. No. IV

Talbot, H. F. (1836) · The London Edinburgh and Dublin Philosophical Magazine and Journal of Science · doi:10.1080/14786443608649032 · Cited by 617 · see citing works

EUV Sources for Lithography

(2006) · SPIE eBooks · doi:10.1117/3.613774 · Cited by 332 · see citing works

Deep-UV Surface-Enhanced Resonance Raman Scattering of Adenine on Aluminum Nanoparticle Arrays

Jha, S. K., Ahmed, Z., Agio, M., Ekinci, Y., & Löffler, J. F. (2012) · Journal of the American Chemical Society · doi:10.1021/ja210446w · Cited by 254 · see citing works

Nanostructures and Functional Materials Fabricated by Interferometric Lithography

Xia, D., Ku, Z., Lee, S. C., & Brueck, S. R. J. (2010) · Advanced Materials · doi:10.1002/adma.201001856 · Cited by 226 · see citing works

3D Micro‐ and Nanostructures via Interference Lithography

Jang, J., Ullal, C. K., Maldovan, M., Gorishnyy, T., Kooi, S. E., Koh, C. Y., & Thomas, E. L. (2007) · Advanced Functional Materials · doi:10.1002/adfm.200700140 · Cited by 220 · see citing works

Lithography at EUV wavelengths

Tallents, G. J., Wagenaars, E., & Pert, G. J. (2010) · Nature Photonics · doi:10.1038/nphoton.2010.277 · Cited by 206 · see citing works

Sub-50 nm period patterns with EUV interference lithography

Solak, H. H., David, C., Gobrecht, J., et al. (2003) · Microelectronic Engineering · doi:10.1016/s0167-9317(03)00059-5 · Cited by 195 · see citing works

Sub-10 nm patterning using EUV interference lithography

Päivänranta, B., Langner, A., Kirk, E. C., Dávid, C., & Ekinci, Y. (2011) · Nanotechnology · doi:10.1088/0957-4484/22/37/375302 · Cited by 173 · see citing works

Beyond EUV lithography: a comparative study of efficient photoresists' performance

Mojarad, N., Gobrecht, J., & Ekinci, Y. (2015) · Scientific Reports · doi:10.1038/srep09235 · Cited by 162 · see citing works

Talbot lithography: Self-imaging of complex structures

Isoyan, A., Jiang, F., Cheng, Y., et al. (2009) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.3258144 · Cited by 113 · see citing works

Evaluation of EUV resist materials for use at the 32 nm half-pitch node

Wallow, T. I., Higgins, C., Brainard, R. L., Petrillo, K. E., Montgomery, W., Koay, C.-S., Denbeaux, G., Wood, O. R., & Wei, Y. (2008) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.772943 · Cited by 110 · see citing works

Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond

Mojarad, N., Hojeij, M., Wang, L., Gobrecht, J., & Ekinci, Y. (2015) · Nanoscale · doi:10.1039/c4nr07420c · Cited by 102 · see citing works

High Aspect Ratio Plasmonic Nanostructures for Sensing Applications

Päivänranta, B., Merbold, H., Giannini, R., et al. (2011) · ACS Nano · doi:10.1021/nn201529x · Cited by 96 · see citing works

Fabrication of sub-10 nm gap arrays over large areas for plasmonic sensors

Siegfried, T., Ekinci, Y., Solak, H. H., et al. (2011) · Applied Physics Letters · doi:10.1063/1.3672045 · Cited by 89 · see citing works

Gap Plasmons and Near-Field Enhancement in Closely Packed Sub-10 nm Gap Resonators

Siegfried, T., Ekinci, Y., Martin, O. J. F., et al. (2013) · Nano Letters · doi:10.1021/nl403030g · Cited by 87 · see citing works

Photon-beam lithography reaches 12.5nm half-pitch resolution

Solak, H. H., Ekinci, Y., Käser, P., et al. (2007) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2401612 · Cited by 85 · see citing works

Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond

Ekinci, Y., Vockenhuber, M., Hojeij, M., Wang, L., & Mojarad, N. (2013) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2011533 · Cited by 83 · see citing works

20nm Line/space patterns in HSQ fabricated by EUV interference lithography

Ekinci, Y., Solak, H. H., Padeste, C., et al. (2007) · Microelectronic Engineering · doi:10.1016/j.mee.2007.01.213 · Cited by 72 · see citing works

High-resolution and large-area nanoparticle arrays using EUV interference lithography

Karim, W., Tschupp, S. A., Oezaslan, M., et al. (2015) · Nanoscale · doi:10.1039/c5nr00565e · Cited by 66 · see citing works

Reflective multilayer optics for 6.7 nm wavelength radiation sources and next generation lithography

Tsarfati, T., van de Kruijs, R. W. E., Zoethout, E., Louis, E., & Bijkerk, F. (2009) · Thin Solid Films · doi:10.1016/j.tsf.2009.09.073 · Cited by 59 · see citing works

Achromatic spatial frequency multiplication: A method for production of nanometer-scale periodic structures

Solak, H. H., & Ekinci, Y. (2005) · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena · doi:10.1116/1.2121735 · Cited by 54 · see citing works

High-performance soft x-ray spectromicroscopy beamline at SSRF

Xue, C., Wang, Y., Guo, Z., Wu, Y., Zhen, X., Chen, M., Chen, J., Xue, S., Peng, Z., Lu, Q., et al. (2010) · Review of Scientific Instruments · doi:10.1063/1.3491837 · Cited by 54 · see citing works

The Future of Lithography: SEMATECH Litho Forum 2008

Willson, C. G., & Roman, B. J. (2008) · ACS Nano · doi:10.1021/nn800410c · Cited by 52 · see citing works

Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths

Mojarad, N., Fan, D., Gobrecht, J., & Ekinci, Y. (2014) · Optics Letters · doi:10.1364/ol.39.002286 · Cited by 50 · see citing works

Nanopatterning of gold colloids for label-free biosensing

Städler, B., Solak, H. H., Frerker, S., et al. (2007) · Nanotechnology · doi:10.1088/0957-4484/18/15/155306 · Cited by 47 · see citing works

Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm

Bergmann, K., Danylyuk, S., & Juschkin, L. (2009) · Journal of Applied Physics · doi:10.1063/1.3243287 · Cited by 45 · see citing works

Evaluation of resist performance with EUV interference lithography for sub-22-nm patterning

Ekinci, Y., Vockenhuber, M., Terhalle, B., et al. (2012) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.916541 · Cited by 44 · see citing works

EUV sources for Lithography

Richardson, M. C. (2007) · Conference proceedings · doi:10.1109/leos.2007.4382489 · Cited by 42 · see citing works

Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency

Bergmann, K., Rosier, O., Neff, W., et al. (2000) · Applied Optics · doi:10.1364/ao.39.003833 · Cited by 38 · see citing works

Fabrication of quasiperiodic nanostructures with EUV interference lithography

Langner, A., Päivänranta, B., Terhalle, B., et al. (2012) · Nanotechnology · doi:10.1088/0957-4484/23/10/105303 · Cited by 32 · see citing works

Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography

Brose, S., Danylyuk, S., Juschkin, L., et al. (2012) · Thin Solid Films · doi:10.1016/j.tsf.2012.03.036 · Cited by 31 · see citing works

Optics for ASML's NXE:3300B platform

Lowisch, M., Kuerz, P., Conradi, O., Wittich, G., Seitz, W., & Kaiser, W. M. (2013) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2012158 · Cited by 28 · see citing works

Nickel electroplating for high-resolution nanostructures

Hili, K., Fan, D., Guzenko, V. A., et al. (2015) · Microelectronic Engineering · doi:10.1016/j.mee.2015.02.031 · Cited by 27 · see citing works

Fabrication of high-resolution large-area patterns using EUV interference lithography in a scan-exposure mode

Wang, L., Solak, H. H., & Ekinci, Y. (2012) · Nanotechnology · doi:10.1088/0957-4484/23/30/305303 · Cited by 25 · see citing works

EUV Interference Lithography for 1X nm

Urayama, T., Watanabe, T., Yamaguchi, Y., et al. (2011) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.24.153 · Cited by 25 · see citing works

Novel Optical Technologies for Nanofabrication

Liu, Q., Duan, X., & Peng, C. (2013) · Nanostructure science and technology · doi:10.1007/978-3-642-40387-3 · Cited by 23 · see citing works

The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm

Anderson, C. N., Ashworth, D., Baclea-an, L.-M., Bhattari, S., Chao, R., Claus, R. A., Denham, P., Goldberg, K. A., Grenville, A., Jones, G., et al. (2012) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.917386 · Cited by 22 · see citing works

High-resolution nanopatterning by achromatic spatial frequency multiplication with electroplated grating structures

Wang, L., Terhalle, B., Hojeij, M., et al. (2012) · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · doi:10.1116/1.3697753 · Cited by 20 · see citing works

Evaluation of resist sensitivity in extreme ultraviolet/soft x-ray region for next-generation lithography

Isoyama, G., Oshima, A., Washio, M., & Tagawa, S. (2011) · AIP Advances · doi:10.1063/1.3665672 · Cited by 20 · see citing works

Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays

Danylyuk, S., Kim, H., Brose, S., et al. (2013) · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · doi:10.1116/1.4789445 · Cited by 17 · see citing works

Optical Sensing with Simultaneous Electrochemical Control in Metal Nanowire Arrays

MacKenzie, R., Fraschina, C., Sannomiya, T., et al. (2010) · Sensors · doi:10.3390/s101109808 · Cited by 17 · see citing works

Coherent diffraction lithography: Periodic patterns via mask-based interference lithography

Fucetola, C. P., Patel, A. A., Moon, E. E., et al. (2009) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.3237093 · Cited by 16 · see citing works

Extreme UV diffraction grating fabricated by nanoimprint lithography

Lin, C.-H. S., Lin, Y.-M., Liang, C., et al. (2012) · Microelectronic Engineering · doi:10.1016/j.mee.2012.07.037 · Cited by 15 · see citing works

EUV interferometric lithography and structural characterization of an EUV diffraction grating with nondestructive spectroscopic ellipsometry

Lin, C.-H. S., Fong, C.-H., Lin, Y.-M., et al. (2011) · Microelectronic Engineering · doi:10.1016/j.mee.2011.02.002 · Cited by 14 · see citing works

High diffraction-efficiency molybdenum gratings for EUV lithography

Saidani, M., & Solak, H. H. (2009) · Microelectronic Engineering · doi:10.1016/j.mee.2009.02.019 · Cited by 12 · see citing works

First operation of 11 m long undulator at NewSUBARU

Hashimoto, S., Ando, A., Niibe, M., et al. (2001) · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · doi:10.1016/s0168-9002(01)00232-7 · Cited by 12 · see citing works

Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography

Wang, L., Kirk, E. C., Wäckerlin, C., et al. (2014) · Nanotechnology · doi:10.1088/0957-4484/25/23/235305 · Cited by 11 · see citing works

Positive-tone chemically amplified fullerene resist

Manyam, J., Frommhold, A., Yang, D., et al. (2012) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.916472 · Cited by 9 · see citing works

Effect of the Al0.3Ga0.7As interlayer thickness upon the quality of GaAs on a Ge substrate grown by metal-organic chemical vapor deposition

Li, S., Chen, Q., Zhang, J., et al. (2013) · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · doi:10.1116/1.4809514 · Cited by 9 · see citing works

Patterning at 6.5 nm wavelength using interference lithography

Mojarad, N., Vockenhuber, M., Wang, L., Terhalle, B., & Ekinci, Y. (2013) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2011556 · Cited by 9 · see citing works

Method of predicting resist sensitivity for 6.x nm extreme ultraviolet lithography

Isoyama, G., Oshima, A., Washio, M., & Tagawa, S. (2013) · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · doi:10.1116/1.4813789 · Cited by 8 · see citing works

Development of core technologies on EUV mask and resist for sub-20-nm half pitch generation

Inoue, S., Amano, T., Itani, T., Watanabe, H., Mori, I., Watanabe, T., Kinoshita, H., Miyai, H., & Hatakeyama, M. (2012) · Advanced Optical Technologies · doi:10.1515/aot-2012-0029 · Cited by 7 · see citing works

Controlledin situnanoscale enhancement of gold nanowire arrays with plasmonics

MacKenzie, R., Fraschina, C., Sannomiya, T., et al. (2010) · Nanotechnology · doi:10.1088/0957-4484/22/5/055203 · Cited by 4 · see citing works

Ultra-dense silicon nanowires using extreme ultraviolet interference lithography

Fan, D., Sigg, H. C., Gobrecht, J., et al. (2014) · International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) · doi:10.1109/3m-nano.2014.7057336 · Cited by 2 · see citing works

Evolution in Lithography Techniques: Microlithography to Nanolithography

Sharma, E., Rathi, R., Misharwal, J., Sinhmar, B., Kumari, S., Dalal, J., & Kumar, A. (2022) · Nanomaterials · doi:10.3390/nano12162754 · Cited by 257 · see citing works

Extreme ultraviolet lithography

Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149 · see citing works

Extreme ultraviolet lithography reaches 5 nm resolution

Giannopoulos, I., Mochi, I., Vockenhuber, M., Ekinci, Y., & Kazazis, D. (2024) · Nanoscale · doi:10.1039/d4nr01332h · Cited by 69 · see citing works

Mixed-ligand zinc-oxoclusters: Efficient chemistry for high resolution nanolithography

Thakur, N., Bliem, R., Mochi, I., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2020) · Journal of Materials Chemistry C · doi:10.1039/d0tc03597a · Cited by 52 · see citing works

Mechanistic insights in Zr-and Hf-based molecular hybrid EUV photoresists

Wu, L., Baljozovic, M., Portale, G., Kazazis, D., Vockenhuber, M., Jung, T., Ekinci, Y., & Castellanos Ortega, S. (2019) · Journal of Micro/Nanopatterning Materials and Metrology · doi:10.1117/1.jmm.18.1.013504 · Cited by 49 · see citing works

Resistless EUV lithography: Photon-induced oxide patterning on silicon

Tseng, L.-T., Karadan, P., Kazazis, D., Constantinou, P. C., Stock, T. J. Z., Curson, N. J., Schofield, S. R., Muntwiler, M., Aeppli, G., & Ekinci, Y. (2023) · Science Advances · doi:10.1126/sciadv.adf5997 · Cited by 34 · see citing works

EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning

Constantinou, P., Stock, T. J. Z., Tseng, L.-T., Kazazis, D., Muntwiler, M., Vaz, C. A. F., Ekinci, Y., Aeppli, G., Curson, N. J., & Schofield, S. R. (2024) · Nature Communications · doi:10.1038/s41467-024-44790-6 · Cited by 27 · see citing works

The recent development of soft x-ray interference lithography in SSRF

Zhao, J., Yang, S., Xue, C., Wang, L., Liang, Z., Zhang, L., Wang, Y., Wu, Y., & Tai, R. (2020) · International Journal of Extreme Manufacturing · doi:10.1088/2631-7990/ab70ae · Cited by 26 · see citing works

High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers

Wang, X., Kazazis, D., Tseng, L.-T., Robinson, A. P. G., & Ekinci, Y. (2022) · Nanotechnology · doi:10.1088/1361-6528/ac328b · Cited by 15 · see citing works

Development of EUV interference lithography for 25 nm line/space patterns

Sahoo, A. K., Chen, P.-H., Lin, C.-H., Liu, R.-S., Lin, B.-J., Kao, T.-S., Chiu, P.-W., Huang, T.-P., Lai, W.-Y., Wang, J., et al. (2023) · Micro and Nano Engineering · doi:10.1016/j.mne.2023.100215 · Cited by 6 · see citing works

Plasmonic Interference Lithography for Low-Cost Fabrication of Dense Lines with Sub-50 nm Half-Pitch

Kong, W., Luo, Y., Zhao, C., et al. (2019) · ACS Applied Nano Materials · doi:10.1021/acsanm.8b02047 · Cited by 25 · see citing works

Theoretical investigation of two-dimensional sub-wavelength structures fabricated by multi-beam surface plasmon interference lithography

Wang, X., Jia, T., Ren, Y., et al. (2021) · Europhysics Letters (EPL) · doi:10.1209/0295-5075/ac2cf9 · Cited by 4 · see citing works

Pattern-Integrated Interference Lithography for 2D and 3D Photonic Crystals

Gaylord, T. K., & Leibovici, M. C. R. (2013) · Frontiers in Optics · doi:10.1364/fio.2013.fth2f.1

From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography

Allenet, T., Mortelmans, T., Vockenhuber, M., et al. (2021) · International Conference on Extreme Ultraviolet Lithography · doi:10.1117/12.2600920 · Cited by 2 · see citing works

Standard AZ 5214E photoresist in laser interference and EBDW lithographies

Skriniarova, J., Andok, R., Pudiš, D., et al. (2014) · Vacuum · doi:10.1016/j.vacuum.2014.09.012 · Cited by 5 · see citing works