The DOI matches its Crossref record; 87 of the 87 references it cites were found in a registry or an index.
Perspective: Ga2O3 for ultra-high power rectifiers and MOSFETS
Abstract
Gallium oxide (Ga2O3) is emerging as a viable candidate for certain classes of power electronics with capabilities beyond existing technologies due to its large bandgap, controllable doping, and the availability of large diameter, relatively inexpensive substrates. These applications include power conditioning systems, including pulsed power for avionics and electric ships, solid-state drivers for heavy electric motors, and advanced power management and control electronics. Wide bandgap (WBG) power devices offer potential savings in both energy and cost. However, converters powered by WBG devices require innovation at all levels, entailing changes to system design, circuit architecture, qualification metrics, and even market models. The performance of high voltage rectifiers and enhancement-mode metal-oxide field effect transistors benefits from the larger critical electric field of β-Ga2O3 relative to either SiC or GaN. Reverse breakdown voltages of over 2 kV for β-Ga2O3 have been reported, either with or without edge termination and over 3 kV for a lateral field-plated Ga2O3 Schottky diode on sapphire. The metal-oxide-semiconductor field-effect transistors fabricated on Ga2O3 to date have predominantly been depletion (d-mode) devices, with a few demonstrations of enhancement (e-mode) operation. While these results are promising, what are the limitations of this technology and what needs to occur for it to play a role alongside the more mature SiC and GaN power device technologies? The low thermal conductivity might be mitigated by transferring devices to another substrate or thinning down the substrate and using a heatsink as well as top-side heat extraction. We give a perspective on the materials’ properties and physics of transport, thermal conduction, doping capabilities, and device design that summarizes the current limitations and future areas of development. A key requirement is continued interest from military electronics development agencies. The history of the power electronics device field has shown that new technologies appear roughly every 10-12 years, with a cycle of performance evolution and optimization. The older technologies, however, survive long into the marketplace, for various reasons. Ga2O3 may supplement SiC and GaN, but is not expected to replace them.
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Cites
A review of Ga2O3 materials, processing, and devices
Pearton, S. J., Yang, J., Cary, P. H., Ren, F., Kim, J., Tadjer, M. J., & Mastro, M. A. (2018) · Applied Physics Reviews · doi:10.1063/1.5006941 · Cited by 3,117
Self-citationDeterministic transfer of two-dimensional materials by all-dry viscoelastic stamping
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GaN-Based RF Power Devices and Amplifiers
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Self-citationRecent progress in Ga2O3power devices
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Oxygen vacancies and donor impurities in β-Ga2O3
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High-quality β-Ga2O3 single crystals grown by edge-defined film-fed growth
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Metadata
- Authors
- Pearton, S. J., Ren, F., Tadjer, M., & Kim, J.
- Venue
- Journal of Applied Physics
- Publisher
- AIP Publishing
- Published
- 2018-12-11
- Volume
- 124
- Issue
- 22
- ISSN
- 0021-8979 (ISSN-L)
- 1089-7550
- OpenAlex
- W2905220617
- Cited by
- 659
- References
- 87
- FWCI
- 15.32
- Type
- journal article
- Language
- en
- Open access
- closed
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