The recent development of soft x-ray interference lithography in SSRF

Optical negative-index metamaterials

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Extreme ultraviolet resist materials for sub-7 nm patterning

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Ultranarrow Band Absorbers Based on Surface Lattice Resonances in Nanostructured Metal Surfaces

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Sub-50 nm period patterns with EUV interference lithography

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Sub-10 nm patterning using EUV interference lithography

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Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications

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Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond

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High Aspect Ratio Plasmonic Nanostructures for Sensing Applications

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Extreme ultraviolet interference lithography at the Paul Scherrer Institut

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Metasurface-Based Ultrathin Beam Splitter with Variable Split Angle and Power Distribution

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Large-scale uniform Au nanodisk arrays fabricated via x-ray interference lithography for reproducible and sensitive SERS substrate

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20nm Line/space patterns in HSQ fabricated by EUV interference lithography

Ekinci, Y., Solak, H. H., Padeste, C., et al. (2007) · Microelectronic Engineering · doi:10.1016/j.mee.2007.01.213 · Cited by 72 · see citing works

High-resolution and large-area nanoparticle arrays using EUV interference lithography

Karim, W., Tschupp, S. A., Oezaslan, M., et al. (2015) · Nanoscale · doi:10.1039/c5nr00565e · Cited by 66 · see citing works

Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography

Zhu, Z., Wu, S., Xue, C., et al. (2015) · Applied Physics Letters · doi:10.1063/1.4922699 · Cited by 58 · see citing works

Characterization of extreme ultraviolet resists with interference lithography

Gronheid, R., Solak, H. H., Ekinci, Y., et al. (2006) · Microelectronic Engineering · doi:10.1016/j.mee.2006.01.149 · Cited by 55 · see citing works

Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths

Mojarad, N., Fan, D., Gobrecht, J., & Ekinci, Y. (2014) · Optics Letters · doi:10.1364/ol.39.002286 · Cited by 50 · see citing works

Molecular Glass Resists Based on 9,9′-Spirobifluorene Derivatives: Pendant Effect and Comprehensive Evaluation in Extreme Ultraviolet Lithography

Chen, J., Hao, Q., Wang, S., Li, S., Yu, T., Zeng, Y. P., Zhao, J., Yang, S., Wu, Y., Xue, C., et al. (2019) · ACS Applied Polymer Materials · doi:10.1021/acsapm.8b00235 · Cited by 46 · see citing works

Strain and thermal conductivity in ultrathin suspended silicon nanowires

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Polarization-independent plasmonic subtractive color filtering in ultrathin Ag nanodisks with high transmission

Hu, X. L., Sun, L. B., Zeng, B., et al. (2015) · Applied Optics · doi:10.1364/ao.55.000148 · Cited by 34 · see citing works

Fabrication of ultra-high aspect ratio (>160:1) silicon nanostructures by using Au metal assisted chemical etching

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Fabrication of Thiol–Ene “Clickable” Copolymer-Brush Nanostructures on Polymeric Substrates via Extreme Ultraviolet Interference Lithography

Dübner, M., Gevrek, T. N., Sanyal, A., et al. (2015) · ACS Applied Materials & Interfaces · doi:10.1021/acsami.5b01804 · Cited by 29 · see citing works

Space-invariant multiple-beam achromatic EUV interference lithography

Solak, H. H. (2005) · Microelectronic Engineering · doi:10.1016/j.mee.2005.01.012 · Cited by 27 · see citing works

Fabrication of high-resolution large-area patterns using EUV interference lithography in a scan-exposure mode

Wang, L., Solak, H. H., & Ekinci, Y. (2012) · Nanotechnology · doi:10.1088/0957-4484/23/30/305303 · Cited by 25 · see citing works

EUV Interference Lithography for 1X nm

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4X reduction extreme ultraviolet interferometric lithography

Isoyan, A., Wüest, A., Wallace, J., et al. (2008) · Optics Express · doi:10.1364/oe.16.009106 · Cited by 24 · see citing works

Printing of sub-20 nm wide graphene ribbon arrays using nanoimprinted graphite stamps and electrostatic force assisted bonding

Wang, C., Morton, K. J., Fu, Z., et al. (2011) · Nanotechnology · doi:10.1088/0957-4484/22/44/445301 · Cited by 24 · see citing works

Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography

Xue, C., Zhao, J., Wu, Y., Yu, H., Yang, S., Wang, L., Zhao, W., Wu, Q., Zhu, Z., Liu, B., et al. (2017) · Applied Surface Science · doi:10.1016/j.apsusc.2017.07.010 · Cited by 23 · see citing works

A novel EUV exposure station for nanotechnology studies

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Broad band optical band-reject filters in near-infrared regime utilizing bilayer Ag metasurface

Hu, X. L., Sun, L. B., Wu, Q., et al. (2017) · Journal of Applied Physics · doi:10.1063/1.4981894 · Cited by 20 · see citing works

Novel High Sensitivity EUV Photoresist for Sub-7 nm Node

Nagai, T., Nakagawa, H., Naruoka, T., et al. (2016) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.29.475 · Cited by 19 · see citing works

Enhancement of directional broadband luminescence from a scintillation film via guided-mode resonance in a photonic crystal structure

Zhu, Z., Liu, B., Cheng, C., et al. (2017) · Applied Physics Letters · doi:10.1063/1.4975363 · Cited by 18 · see citing works

Sensitivity enhancement of the high-resolution xMT multi-trigger resist for EUV lithography

Popescu, C. M., Frommhold, A., McClelland, A., Roth, J., Ekinci, Y., & Robinson, A. P. G. (2017) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2258098 · Cited by 18 · see citing works

Developments at SSRF in soft X-ray interference lithography

杨树敏, 王连升, 赵俊, et al. (2015) · Nuclear Science and Techniques · doi:10.13538/j.1001-8042/nst.26.010101 · Cited by 17 · see citing works

Fabrication of ultrahigh resolution metal nanowires and nanodots through EUV interference lithography

Huang, J., Fan, D., Ekinci, Y., et al. (2015) · Microelectronic Engineering · doi:10.1016/j.mee.2015.01.016 · Cited by 16 · see citing works

Aluminum oxide mask fabrication by focused ion beam implantation combined with wet etching

Liu, Z., Iltanen, K., Chekurov, N., et al. (2013) · Nanotechnology · doi:10.1088/0957-4484/24/17/175304 · Cited by 15 · see citing works

EUV resists towards 11nm half-pitch

Ekinci, Y., Vockenhuber, M., Mojarad, N., & Fan, D. (2014) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2046459 · Cited by 15 · see citing works

Extreme UV diffraction grating fabricated by nanoimprint lithography

Lin, C.-H. S., Lin, Y.-M., Liang, C., et al. (2012) · Microelectronic Engineering · doi:10.1016/j.mee.2012.07.037 · Cited by 15 · see citing works

Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography

Zhao, J., Wu, Y., Xue, C., et al. (2016) · Microelectronic Engineering · doi:10.1016/j.mee.2016.12.028 · Cited by 15 · see citing works

Directional emission of plastic luminescent films using photonic crystals fabricated by soft-X-ray interference lithography and reactive ion etching

Wu, Q., Liu, B., Zhu, Z., Gu, M., Chen, H., Xue, C., Zhao, J., Wu, Y., Tai, R., & Ouyang, X. (2018) · Scientific Reports · doi:10.1038/s41598-018-27593-w · Cited by 15 · see citing works

EUV interferometric lithography and structural characterization of an EUV diffraction grating with nondestructive spectroscopic ellipsometry

Lin, C.-H. S., Fong, C.-H., Lin, Y.-M., et al. (2011) · Microelectronic Engineering · doi:10.1016/j.mee.2011.02.002 · Cited by 14 · see citing works

Guided-mode resonance assisted directional emission of a wavelength-shifting film for application in scintillation detection

Wu, S., Liu, B., Zhu, Z., et al. (2016) · Optics Express · doi:10.1364/oe.24.000231 · Cited by 14 · see citing works

Outgassing analysis of molecular glass photoresists under EUV irradiation

Chen, L., Xu, J., Yuan, H. T., et al. (2014) · Science China Chemistry · doi:10.1007/s11426-014-5122-y · Cited by 13 · see citing works

High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography

Sun, L., Hu, X., Wu, Q., et al. (2016) · Optics Express · doi:10.1364/oe.24.019112 · Cited by 12 · see citing works

Chemically-amplified EUV resists approaching 11 nm half-pitch

Mochi, I., Olvera, K. G., Meeuwissen, M., et al. (2018) · doi:10.1117/12.2299643 · Cited by 12 · see citing works

Development of interference lithography for 22 nm node and below

Fukushima, Y., Yamaguchi, Y., Iguchi, T., et al. (2011) · Microelectronic Engineering · doi:10.1016/j.mee.2011.02.076 · Cited by 11 · see citing works

Fast and large-area fabrication of plasmonic reflection color filters by achromatic Talbot lithography

Wu, Q., Xia, H., Jia, H., et al. (2019) · Optics Letters · doi:10.1364/ol.44.001031 · Cited by 11 · see citing works

Development of broadband X-ray interference lithography large area exposure system

Xue, C., Wu, Y., Zhu, F., et al. (2016) · Review of Scientific Instruments · doi:10.1063/1.4947067 · Cited by 10 · see citing works

Evaluation of EUV resists for 5nm technology node and beyond

Taşdemir, Z., Mochi, I., van Lent-Protasova, L., et al. (2018) · International Conference on Extreme Ultraviolet Lithography · doi:10.1117/12.2502688 · Cited by 10 · see citing works

Novel EUV resist materials design for 14nm half pitch and below

Tsubaki, H., Tarutani, S., Fujimori, T., et al. (2014) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2046205 · Cited by 9 · see citing works

Duty cycle dependency of the optical transmission spectrum in an ultrathin nanostructured Ag film

Ye, M., Hu, X. L., Sun, L. B., et al. (2014) · Journal of Alloys and Compounds · doi:10.1016/j.jallcom.2014.09.202 · Cited by 9 · see citing works

Micro- and Nano-Metal Structures Fabrication Technology and Applications

谢常青, Xiaoli, 朱. Z., Jiebing, 牛. N., et al. (2011) · Acta Optica Sinica · doi:10.3788/aos201131.0900128 · Cited by 9 · see citing works

Parallel direct writing achromatic talbot lithography: a method for large-area arbitrary sub-micron periodic nano-arrays fabrication

Yang, S., Xue, C., Zhao, J., et al. (2019) · Nanotechnology · doi:10.1088/1361-6528/ab1108 · Cited by 8 · see citing works

Patterning at the nanoscale: Atomic force microscopy and extreme ultraviolet interference lithography

Parisse, P., Luciani, D., D’Angelo, A., et al. (2009) · Materials Science and Engineering B · doi:10.1016/j.mseb.2009.07.003 · Cited by 7 · see citing works

Structure formation in atom lithography using geometric collimation

Meijer, T., Beardmore, J. P., Fabrie, C. G. C. H. M., et al. (2011) · Applied Physics B · doi:10.1007/s00340-011-4743-5 · Cited by 7 · see citing works

Extreme ultraviolet lithography

Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149 · see citing works

Comparison of Optical, X-ray, Electron and Ion Beam Lithography

Okazaki, S. (1989) · Microelectronic Engineering · doi:10.1016/0167-9317(89)90068-3 · Cited by 6 · see citing works

Charged Particle Lithography

Okoroanyanwu, U. (2010) · SPIE eBooks · doi:10.1117/3.821384.ch15

Study on the Recognition of the Registration Marks for Low-Energy Microcolumn Lithography

Ahn, S., Kim, H. S., Kim, D., et al. (2008) · Materials science forum · doi:10.4028/www.scientific.net/msf.569.65

Electron sources for MAPPER maskless lithography

Meijer, J. R., Gurtler, L. D., Steenbrink, S. W. H. K., et al. (2014) · International Vacuum Electron Sources Conference · doi:10.1109/ivesc.2014.6892033 · Cited by 1 · see citing works

Pattern-Integrated Interference Lithography for 2D and 3D Photonic Crystals

Gaylord, T. K., & Leibovici, M. C. R. (2013) · Frontiers in Optics · doi:10.1364/fio.2013.fth2f.1