Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond

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Lithography gets extreme

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Lithography at EUV wavelengths

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Principles of Lithography

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Beam pen lithography

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Sub-10 nm Device Fabrication in a Transmission Electron Microscope

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Two-Dimensional Pattern Formation Using Graphoepitaxy of PS‑ b ‑PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

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6 nm half-pitch lines and 0.04 µm2static random access memory patterns by nanoimprint lithography

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Multiple electron-beam lithography

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High resolution, high sensitivity inorganic resists

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Chemical and Structural Investigation of High-Resolution Patterning with HafSOx

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Patterning Polymeric Structures with 2 nm Resolution at 3 nm Half Pitch in Ambient Conditions

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High refractive index and high transparency HfO2 nanocomposites for next generation lithography

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Super-selective cryogenic etching for sub-10 nm features

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The Future of Lithography: SEMATECH Litho Forum 2008

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Hafnium Sulfate Prenucleation Clusters and the Hf 18 Polyoxometalate Red Herring

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Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths

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Electron beam exposure mechanisms in hydrogen silsesquioxane investigated by vibrational spectroscopy and in-situ electron beam induced desorption

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Nanoimprint Lithography: An Enabling Process for Nanofabrication

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Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained from High Resolution Transmission Electron Microscopy

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Direct write lithography: the global solution for R&D and manufacturing

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Beyond EUV lithography: a comparative study of efficient photoresists' performance

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Extreme ultraviolet lithography

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Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications

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Absorption coefficient of metal-containing photoresists in the extreme ultraviolet

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Photolithography reaches 6 nm half-pitch using extreme ultraviolet light

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The recent development of soft x-ray interference lithography in SSRF

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High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers

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Development of EUV interference lithography for 25 nm line/space patterns

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Extreme ultraviolet resist outgassing and its effect on nearby optics

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Quantitative measurement of EUV resist outgassing

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Pulsed Plasma EUV Sources

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Optical Devices for Extreme Ultraviolet

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Development of Extreme-Ultraviolet Light Source by Laser-Produced Plasma

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