Essential physics of carrier transport in nanoscale MOSFETs
Abstract
The device physics of nanoscale MOSFETs is explored by numerical simulations of a model transistor. The physics of charge control, source velocity saturation due to thermal injection, and scattering in ultrasmall devices are examined. The results show that the essential physics of nanoscale MOSFETs can be understood in terms of a conceptually simple scattering model.
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Quantum mechanical effects are insignificant at channel length 60 nm and channel thickness 20 nm.
“This study does not take into account the ballistic transport and quantum mechanical effects (QMEs), which become dominant only when the channel length and thickness are less than 10 nm, respectively [34,44].”
From Analytical modeling and doping optimization for enhanced analog performance in a Ge/Si interfaced nanowire MOSFET (2023) · cites this paper as [44]
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Majumdar, A., & Antoniadis, D. A. (2014) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2013.2294380 · Cited by 47 · see citing works
A New Backscattering Model Giving a Description of the Quasi-Ballistic Transport in Nano-MOSFET
Fuchs, E., Dollfus, P., Lecarval, G., Barraud, S., Villanueva, D., Salvetti, F., Jaouen, H., & Skotnicki, T. (2005) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2005.856181 · Cited by 46 · see citing works
Pal, H. S., Cantley, K. D., Ahmed, S., & Lundstrom, M. (2008) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2007.914830 · Cited by 45 · see citing works
Self-citationQuasi-Ballistic Transport in Nanowire Field-Effect Transistors
Gnani, E., Gnudi, A., Reggiani, S., & Baccarani, G. (2008) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2008.2005178 · Cited by 44 · see citing works
Xu, L., Qiu, C., Zhao, C., Zhang, Z., & Peng, L. (2019) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2019.2920846 · Cited by 44 · see citing works
Performance Comparison of GaSb, Strained-Si, and InGaAs Double-Gate Ultrathin-Body n-FETs
Luisier, M. (2011) · IEEE Electron Device Letters · doi:10.1109/led.2011.2168377 · Cited by 43 · see citing works
Barral, V., Poiroux, T., Saint-Martin, J., Munteanu, D., Autran, J., & Deleonibus, S. (2009) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2008.2011681 · Cited by 43 · see citing works
Performance Analysis of 60-nm Gate-Length III–V InGaAs HEMTs: Simulations Versus Experiments
Neophytou, N., Rakshit, T., & Lundstrom, M. (2009) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2009.2021437 · Cited by 42 · see citing works
Self-citationMonte Carlo simulation and measurement of nanoscale n-MOSFETs
Bufler, F. M., Asahi, Y., Yoshimura, H., Zechner, C., Schenk, A., & Fichtner, W. (2003) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2002.808420 · Cited by 42 · see citing works
Sano, N. (2004) · Physical Review Letters · doi:10.1103/physrevlett.93.246803 · Cited by 41 · see citing works
Quantum simulations of an ultrashort channel single-gated n-MOSFET on SOI
Knoch, J., Lengeler, B., & Appenzeller, J. (2002) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2002.1013278 · Cited by 41 · see citing works
Carbon Nanotube Electronics: Modeling, Physics, and Applications
Guo, J. H. (2006) · Purdue e-Pubs (Purdue University System) · Cited by 41 · see citing works
Physics of Carrier Backscattering in One- and Two-Dimensional Nanotransistors
Kim, R., & Lundstrom, M. (2008) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2008.2008368 · Cited by 40 · see citing works
Self-citationTerahertz Plasmonic Technology
Shur, M. S. (2020) · IEEE Sensors Journal · doi:10.1109/jsen.2020.3022809 · Cited by 40 · see citing works
Querlioz, D., Nguyen, H.-N., Saint-Martin, J., Bournel, A., Galdin-Retailleau, S., & Dollfus, P. (2009) · Journal of Computational Electronics · doi:10.1007/s10825-009-0281-3 · Cited by 40 · see citing works
Clerc, R., Palestri, P., & Selmi, L. (2006) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2006.876387 · Cited by 40 · see citing works
Few electron devices: towards hybrid CMOS-SET integrated circuits
Ionescu, A. M., Declercq, M. J., Mahapatra, S., Banerjee, K., & Gautier, J. (2002) · ACM/IEEE Design Automation Conference (DAC) · doi:10.1109/dac.2002.1012600 · Cited by 40 · see citing works
- Authors
- Lundstrom, M., & Ren, Z.
- Affiliations
- Purdue University West Lafayette (US)
- ORCID
- Venue
- IEEE Transactions on Electron Devices
- Published
- 2002
- Volume
- 49
- Issue
- 1
- Pages
- 133-141
- ISSN
- 0018-9383 (ISSN-L)
- OpenAlex
- W2109617856
- Cited by
- 554
- References
- 29
- Citations by year
- 2026: 8 · 2025: 5 · 2024: 8 · 2023: 8 · 2022: 12 · 2021: 17 · 2020: 16 · 2019: 12 · 2018: 18 · 2017: 22 · 2016: 18 · 2015: 29 · 2014: 19 · 2013: 29 · 2012: 24
- FWCI
- 36.75
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- IEEE Transactions on Electron Devices (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Semiconductor Devices and Circuit Design
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Semiconductor materials and devices
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Quantum and electron transport phenomena
- Keywords
- nanoscale MOSFETs, carrier transport, charge control, velocity saturation, thermal injection, scattering model, device physics
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