Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm
Abstract
We demonstrate high resolution reduction imaging in the soft x-ray spectral region using multilayer-coated reflective optics. In particular, a Schwarzschild objective was used at 20:1 reduction with 14 nm radiation to image line and space features from a transmission mask onto a resist-coated silicon wafer with a resolution better than 0.1 μm. The mirrors of the objective were coated with Mo/Si multilayers to provide nearly 40% reflectance at near-normal incidence for the 14 nm radiation. Our results demonstrate that multilayer coatings are capable of enhancing the reflectance of optical components at soft x-ray wavelengths without significantly degrading their imaging performance.
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Resolutions down to 50 nm at 14 nm wavelength were quickly demonstrated in early EUVL research.
“These early endeavours sparked research in EUVL technology, and resolutions down to 50 nm 16 at 14 nm wavelength were quickly demonstrated.”
From Extreme ultraviolet lithography (2024) · cites this paper as [16]
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- Authors
- Bjorkholm, J. E., Bokor, J., Eichner, L., Freeman, R. R., Gregus, J., Jewell, T. E., Mansfield, W. M., Mac Dowell, A. A., Raab, E. L., Silfvast, W. T., Szeto, L. H., Tennant, D. M., Waskiewicz, W. K., White, D. L., Windt, D. L., Wood, O. R., & Bruning, J. H.
- Affiliations
- AT&T (United States) (US)
- AT&T Bell Laboratories, Holmdel, New Jersey 07733-1988
- GCA Corporation/Tropel Division, Fairport, New York 14450
- Venue
- Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
- Publisher
- American Vacuum Society
- Published
- 1990-11-01
- Volume
- 8
- Issue
- 6
- Pages
- 1509-1513
- ISSN
- 0734-211X (ISSN-L)
- 2327-9877
- OpenAlex
- W2102586241
- Cited by
- 161
- References
- 0
- Citations by year
- 2026: 2 · 2025: 3 · 2024: 3 · 2023: 2 · 2022: 2 · 2020: 2 · 2019: 1 · 2018: 2 · 2016: 1 · 2015: 1 · 2014: 5 · 2013: 1 · 2012: 4
- FWCI
- 25.96
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena (publishedVersion)
- Topics
- Physical Sciences › Physics and Astronomy › Radiation › Advanced X-ray Imaging Techniques
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
- Keywords
- soft X-ray lithography, Mo/Si multilayers, Schwarzschild objective, high-resolution imaging, near-normal incidence
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