Where Is The Lost Resolution?
Abstract
In addition to raising the numerical aperture of the imaging lens or reducing the exposing wavelength to improve resolution in optical lithography, a third direction is pursued, namely restoration of the potential resolution capability that is lost due to incorrect practice. Unlike the former two methods, a gain in depth of focus can accompany improvement in resolution. In this paper, elimination of vibration between the mask and the wafer, resist contrast improvement, and multilayer resist systems are cited as possible means for improvement. Simulation study are given on the effects of vibration and resist contrast improvement to quantitatively assess the improvements.
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The resolution of a lithographic system is governed by the Rayleigh or Abbe formula.
“The resolution of a lithographic system is governed by the Rayleigh 3 or Abbe 4 formula”
From Extreme ultraviolet lithography (2024) · cites this paper as [3]
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Tu, Y. (2026) · Synthesis lectures on engineering, science, and technology · doi:10.1007/978-3-032-04000-8_5
Shen, H., Zhang, L., Wang, J., et al. (2026) · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · doi:10.1116/6.0005261
- Authors
- Lin, B. J.
- Affiliations
- IBM (United States) (US)
- Corresponding author
- Lin, Burn J.
- ORCID
- Lin, Burn J.
- Venue
- SPIE Proceedings
- Publisher
- SPIE
- Published
- 1986-08-20
- Volume
- 0633
- Pages
- 44
- ISSN
- 0277-786X (ISSN-L)
- OpenAlex
- W2012124880
- Cited by
- 40
- References
- 0
- Citations by year
- 2026: 3 · 2025: 4 · 2024: 4 · 2023: 2 · 2022: 1 · 2021: 2 · 2020: 2 · 2019: 4 · 2018: 1 · 2017: 1 · 2015: 2 · 2014: 3 · 2012: 1
- FWCI
- 0.00
- Type
- conference paper
- Language
- en
- Open access
- closed
- Locations
- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Engineering › Biomedical Engineering › Advanced optical system design
- Physical Sciences › Physics and Astronomy › Radiation › Advanced X-ray Imaging Techniques
- Keywords
- photolithography, resolution, depth of focus, vibration suppression, resist contrast, multilayer resist, numerical aperture, wavelength reduction, lithography simulation
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