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Extremely Low On-Resistance and High Breakdown Voltage Observed in Vertical GaN Schottky Barrier Diodes with High-Mobility Drift Layers on Low-Dislocation-Density GaN Substrates

Open access
Saitoh, Yu, Sumiyoshi, Kazuhide, Okada, Masaya, Horii, Taku, Miyazaki, Tomihito, Shiomi, Hiromu, Ueno, Masaki, Katayama, Koji, Kiyama, Makoto, Nakamura, Takao·2010·Applied Physics Express

Abstract

Vertical GaN Schottky barrier diodes (SBDs) were fabricated on freestanding GaN substrates with low dislocation density. High quality n-GaN drift-layer with an electron mobility of 930 cm 2 V -1 s -1 was obtained by optimizing the growth conditions by reducing the intensity of yellow luminescence using conventional photoluminescence measurements. The specific on-resistance ( R on A ) and the breakdown voltage ( V B ) of the SBDs were 0.71 mΩ cm 2 and over 1100 V, respectively. The figure of merit ( V B 2 / R on A ) was 1.7 GW/cm 2 , which is the highest value among previously reported SBDs for both GaN and SiC.

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Metadata

Authors
Saitoh, Y., Sumiyoshi, K., Okada, M., Horii, T., Miyazaki, T., Shiomi, H., Ueno, M., Katayama, K., Kiyama, M., & Nakamura, T.
Venue
Applied Physics Express
Published
2010-07-16
Volume
3
Issue
8
Pages
081001
ISSN
  • 1882-0778 (ISSN-L)
  • 1882-0786
OpenAlex
W1985600998
Cited by
267
References
4
FWCI
3.33
Type
journal article
Language
en
Open access
bronze

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CoChat. (2026). Citation check: Extremely Low On-Resistance and High Breakdown Voltage Observed in Vertical GaN Schottky Barrier Diodes with High-Mobility Drift Layers on Low-Dislocation-Density GaN Substrates. https://app.cochat.ai/papers/10.1143/apex.3.081001
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Saitoh, Y., Sumiyoshi, K., Okada, M., Horii, T., Miyazaki, T., Shiomi, H., Ueno, M., Katayama, K., Kiyama, M., & Nakamura, T. (2010). Extremely Low On-Resistance and High Breakdown Voltage Observed in Vertical GaN Schottky Barrier Diodes with High-Mobility Drift Layers on Low-Dislocation-Density GaN Substrates. Applied Physics Express. https://doi.org/10.1143/apex.3.081001

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