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Cited by 9Electronic and Structural Properties of OxidesElectrical and Thermal Properties of MaterialsAdvanced Materials and Semiconductor Technologies

Rapid Fabrication of Chemical Solution-Deposited Lanthanum Nickelate Thin Films via Intense Pulsed-Light Process

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Park, Junghum, Lim, Yonghyun, Kong, Seokwon, Lee, Hojae, Kim, Young-Beom·2019·Coatings
DOI 10.3390/coatings9060372
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Abstract

In this paper, we demonstrate the practicality and feasibility of the flash light-sintering method to fabricate the ceramic material perovskite structure for lanthanum nickel oxide (LaNiO3; LNO) thin films using flash light irradiation equipment. LNO thin films are deposited on an Si wafer and Al2O3 substrate via the chemical solution deposition (CSD) method and sintered by a thermal and flash light-irradiation process with a bottom heater. The properties of flash light-sintered LNO thin films are compared with those of thermally sintered films. The surface morphology, crystal development, and electric conductivity of the LNO thin films are measured by field-emission scanning electron microscope (FE-SEM), X-ray diffraction (XRD), and a four-point probe, respectively. Flash light sintering was accomplished in milliseconds. Through the comparison of thermal sintering and flash light-sintering results, it was confirmed that perovskite LNO thin films deposited by the CSD method can be fabricated by flash light sintering. We show that the flash light sintering method can solve several inherent issues of the conventional thermal sintering method.

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  • Most authors who studied CSD of LNO films on substrates of various structures reported films with a porous, polycrystalline structure and fine equiaxed grains.

    “Most of the authors who studied the CSD of LNO films on substrates of various structures reported films with a porous, polycrystalline structure and fine equiaxed grains [19,24,41,42].”

    From Control of Columnar Grain Microstructure in CSD LaNiO3 Films (2023) · cites this paper as [41]

    The Results and Discussion (page unavailable) describe pores and small grains in the paper’s CSD LNO films, supporting that part of the morphology claim. They do not describe the grains as equiaxed or establish that most studies across substrates of various structures reported this morphology; the same section also says pores disappeared at higher sintering temperatures. (LLM, conf=0.83)

    Experimental — accuracy not yet measured

  • The creation of a well-defined columnar grain structure in CSD LNO films is challenging to achieve on an amorphous substrate.

    “The creation of a well-defined columnar grain structure in CSD (Chemical Solution Deposition) LNO films is challenging to achieve on an amorphous substrate.”

    From Control of Columnar Grain Microstructure in CSD LaNiO3 Films (2023) · cites this paper as [41]

    The Results and Discussion section describes grain growth, pore size, and crystallinity in CSD LNO films, but does not address whether a well-defined columnar grain structure is difficult to achieve on an amorphous substrate. Searches for “columnar” and “amorphous substrate” found no passage making that point. Page numbers were unavailable in our copy. (LLM, conf=0.73)

    Experimental — accuracy not yet measured

  • Columnar grain growth in CSD films is usually caused by heterogeneous nucleation at the film-substrate interface.

    “Columnar grain growth in CSD films is usually caused by heterogeneous nucleation at the film–substrate interface [34,35,36,37,38,39,40,41,42,43,44,45].”

    From Control of Columnar Grain Microstructure in CSD LaNiO3 Films (2023) · cites this paper as [41]

    The Introduction describes crystallization of chemical solution-deposited films through nucleation and growth, and the Results and Discussion reports grain growth in lanthanum nickelate films. Neither section addresses columnar growth or attributes it to heterogeneous nucleation at the film–substrate interface (searched: columnar, heterogeneous nucleation, film–substrate interface). (LLM, conf=0.76)

    Experimental — accuracy not yet measured

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References 34 · Cited by 9

Research works printed but not linked: 34

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Authors
Park, J., Lim, Y., Kong, S., Lee, H., & Kim, Y.-B.
Affiliations
  • Hanyang University (KR)
  • Department of Mechanical Convergence Engineering, Hanyang University, Seoul 133-791, Korea
Corresponding author
Kim, Young-Beom
ORCID
Venue
Coatings
Publisher
MDPI AG
Published
2019-06-08
Volume
9
Issue
6
Pages
372
ISSN
2079-6412 (ISSN-L)
DOI
10.3390/coatings9060372
OpenAlex
W2948483576
Cited by
9
References
34
Citations by year
2025: 1 · 2024: 1 · 2023: 1 · 2022: 1 · 2021: 4 · 2020: 1
FWCI
0.54
Type
journal article
Language
en
Open access
Licence
Locations
  • Coatings (publishedVersion, cc-by)
  • DOAJ (DOAJ: Directory of Open Access Journals) (submittedVersion)
Funders
  • Korea Institute of Energy Technology Evaluation and Planning (201700000003242)
  • National Research Foundation of Korea (2012R1A6A1029029)
Topics
  • Physical Sciences › Materials Science › Materials Chemistry › Electronic and Structural Properties of Oxides
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Electrical and Thermal Properties of Materials
  • Physical Sciences › Materials Science › Materials Chemistry › Advanced Materials and Semiconductor Technologies
Keywords
LaNiO3, LaNiO3 thin films, intense pulsed light, chemical solution deposition, perovskite oxides, electrical conductivity, surface morphology, crystal growth

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