The DOI matches its Crossref record; 19 of the 19 references it cites were found in a registry or an index.
High-power EUV free-electron laser for future lithography
Open accessAbstract
The development of a high-power EUV light source is very important in EUV lithography to overcome the stochastic effects for higher throughput and higher numerical aperture (NA) in the future. We have designed and studied a high-power EUV free-electron laser (FEL) based on energy-recovery linac (ERL) for future lithography. We show that the EUV-FEL light source has many advantages, such as extremely high EUV power without tin debris, upgradability to a Beyond EUV (BEUV) FEL, polarization controllability for high-NA lithography, low electricity consumption, and low construction and running costs per scanner, as compared to the laser-produced plasma source used for the present EUV lithography exposure tool. Furthermore, the demonstration of proof of concept (PoC) of the EUV-FEL is in progress using the IR-FEL in the Compact ERL (cERL) at the High Energy Accelerator Research Organization. In this paper, we present the EUV-FEL light source for future lithography and progress in the PoC of the EUV-FEL.
Overview
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
Claims other papers make about this one
Each is checked against this paper’s own text: does it say what the citing paper says it does?
EUV free electron laser sources have been proposed and would be capable of powering several scanners simultaneously with a power of 1 kW.
“As an alternative to laser -produced plasma sources, EUV free electron laser (FEL) sources 28 , 29 have also been proposed and would be capable of powering several scanners simultaneously with a power of 1 kW.”
From Extreme ultraviolet lithography (2024) · cites this paper as [28]
Citations
Cites
Analyses for a planar variably-polarizing undulator
Sasaki, S. (1994) · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · doi:10.1016/0168-9002(94)91859-7 · Cited by 226
The JLab high power ERL light source
Neil, G. R., Behre, C., Benson, S. V., et al. (2005) · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · doi:10.1016/j.nima.2005.10.047 · Cited by 100
Statistical simulation of photoresists at EUV and ArF
Biafore, J. J., Smith, M. D., Mack, C. A., Thackeray, J. W., Gronheid, R., Robertson, S. A., Graves, T., & Blankenship, D. (2009) · SPIE Proceedings · doi:10.1117/12.813551 · Cited by 58
Construction and commissioning of the compact energy-recovery linac at KEK
Akemoto, M., Arakawa, D., Asaoka, S., et al. (2017) · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · doi:10.1016/j.nima.2017.08.051 · Cited by 51
Stochastic effects in EUV lithography
Bisschop, P. D., & Hendrickx, E. (2018) · Extreme Ultraviolet (EUV) Lithography · doi:10.1117/12.2300541 · Cited by 42
Benefiting from polarization effects on high-NA imaging
Smith, B. W., Zavyalova, L. V., & Estroff, A. (2004) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.537266 · Cited by 31
Development of the superconducting rf 2-cell cavity for cERL injector at KEK
Watanabe, K., Noguchi, S., Kakō, E., et al. (2013) · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · doi:10.1016/j.nima.2013.02.035 · Cited by 28
Considerations for a free-electron laser-based extreme-ultraviolet lithography program
Hosler, E. R., Wood, O. R., Barletta, W. A., et al. (2015) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2085538 · Cited by 26
Generation of a 500-keV electron beam from a high voltage photoemission gun
Nishimori, N., Nagai, R., Matsuba, S., et al. (2013) · Applied Physics Letters · doi:10.1063/1.4811158 · Cited by 23
Energy Recovery Linacs for Light Sources
Hajima, R. (2010) · Reviews of Accelerator Science and Technology · doi:10.1142/s1793626810000397 · Cited by 19
Kawata, H., Nakamura, N., Sakai, H., et al. (2022) · Journal of Micro/Nanopatterning Materials and Metrology · doi:10.1117/1.jmm.21.2.021210 · Cited by 14
Self-citationHonda, Y., Adachi, M., Eguchi, S., et al. (2021) · Review of Scientific Instruments · doi:10.1063/5.0072511 · Cited by 12
Self-citationThe endless progression of Moore’s law
den hove, L. V. (2022) · Metrology, Inspection, and Process Control XXXVI · doi:10.1117/12.2606055 · Cited by 10
S2E simulation of an ERL-based high-power EUV-FEL source for lithography
Nakamura, N., Kato, R., Miyajima, T., et al. (2017) · Journal of Physics Conference Series · doi:10.1088/1742-6596/874/1/012013 · Cited by 7
Self-citationRecent Developments and Operational Status of the Compact ERL at KEK
Obina, T., Adachi, M., Adachi, S., et al. (2016) · Institutional Repositories DataBase (IRDB) · doi:10.18429/jacow-ipac2016-tupow036 · Cited by 6
Self-citationTsuchiya, K., & Shioya, T. (2015) · Review of Scientific Instruments · doi:10.1063/1.4918793 · Cited by 5
Self-citationInjector Design Towards ERL-Based EUV-FEL for Lithography
Tanaka, O., Miyajima, T., Nakamura, N., et al. (2022) · Institutional Repositories DataBase (IRDB) · doi:10.18429/jacow-ipac2022-wepoms025 · Cited by 2
Self-citationSakanaka, S., Haga, K., Honda, Y., et al. (2016) · Institutional Repositories DataBase (IRDB) · doi:10.18429/jacow-ipac2016-tupow038 · Cited by 1
Self-citationReconstruction and beam-transport study of the cERL dump line for high-power IR-FEL operation
Nakamura, N., Tanimoto, Y., Higashi, N., et al. (2023) · Journal of Physics Conference Series · doi:10.1088/1742-6596/2420/1/012029 · Cited by 1
Self-citation
Flagged first, then by citations
Cited by
Sorted by citations
Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149
Metadata
- Authors
- Nakamura, N., Kato, R., Sakai, H., Tsuchiya, K., Tanimoto, Y., Honda, Y., Miyajima, T., Shimada, M., Tanikawa, T., Tanaka, O. A., Obina, T., & Kawata, H.
- Affiliations
- High Energy Accelerator Research Organization (JP)
- Corresponding author
- Nakamura, Norio
- ORCID
- Venue
- Japanese Journal of Applied Physics
- Publisher
- IOP Publishing
- Published
- 2023-04-19
- Volume
- 62
- Issue
- SG
- Pages
- SG0809
- ISSN
- 0021-4922 (ISSN-L)
- 1347-4065
- OpenAlex
- W4323305926
- Cited by
- 31
- References
- 19
- Citations by year
- 2026: 8 · 2025: 13 · 2024: 9 · 2023: 1
- FWCI
- 2.31
- Type
- journal article
- Language
- en
- Open access
- bronze
- doi.org
- Licence
- Locations
- Japanese Journal of Applied Physics (publishedVersion)
- Institutional Repositories DataBase (IRDB) (submittedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Particle Accelerators and Free-Electron Lasers
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Physics and Astronomy › Nuclear and High Energy Physics › Particle accelerators and beam dynamics
- Keywords
- EUV free-electron laser, EUV lithography, energy recovery linac, high-power light source, polarization control, numerical aperture, proof of concept
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
