Cited by 13Silicon Carbide Semiconductor TechnologiesSemiconductor materials and devicesRadiation Effects in Electronics

The DOI matches its Crossref record.

Channel Hot-Carrier Effect of 4H-SiC MOSFET

Abstract

SiC MOSFET, as power device, can be expected to operate with high drain and high gate voltages, possibly leading to hot-carrier effect. However, hot-carrier degradation in a SiC MOSFET is difficult to detect because the as fabricated devices contain high level of defects. We report, for the first time, evidence of hot-carrier effect in 4H-SiC MOSFET. The result suggests that hot hole from impact ionization trapped in the oxide is the cause of the channel hot-carrier effect.

Overview

Integrity signals

Registry

Crossref · 10.4028/www.scientific.net/msf.615-617.813

Cites

Statistics

Recomputing p-values needs the paper’s full text.

Verification

Claims the paper makes

This paper’s full text isn’t openly available, so its claims and self-check weren’t run. The registry and citation checks still apply.

Claims other papers make about this one

Each is checked against this paper’s own text: does it say what the citing paper says it does?

  • During switching transient, MOSFET operates at relatively high drain-to-source voltage and gate-to-source voltage, and some carriers have enough energy to pass the oxide barrier.

    “During switching transient, MOSFET operates at relatively high drain to source voltage and gate to source voltage, and some carriers have enough energy to pass the oxide barrier [53].”

Citations

Cited by

Sorted by citations

Metadata

Authors
Yu, L. C., Cheung, K. P., Suehle, J. S., Campbell, J. P., Sheng, K., Lelis, A. J., & Ryu, S. H.
Affiliations
  • National Institute of Standards and Technology (US)
  • Rutgers, The State University of New Jersey (US)
  • DEVCOM Army Research Laboratory (US)
  • Wolfspeed, Inc. (United States) (US)
Venue
Materials Science Forum
Published
2009-03-02
Volume
615-617
Pages
813-816
ISSN
  • 0255-5476 (ISSN-L)
  • 1662-9752
OpenAlex
W2091488694
Cited by
12
References
0
Citations by year
2025: 1 · 2024: 1 · 2023: 2 · 2021: 1 · 2019: 2 · 2017: 1 · 2014: 1
FWCI
0.79
Type
journal article
Language
en
Open access
closed
Locations
Materials science forum (publishedVersion)
Funders
National Institute of Standards and Technology
Topics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Semiconductor materials and devices
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Radiation Effects in Electronics
Keywords
4H-SiC MOSFET, silicon carbide power devices, impact ionization, hot carrier degradation

About these checks

Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.

Statistics and arithmetic are recomputed, not judged.

Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.

What counts as a claim ›How we measure confidence ›How we check this ›

Are you an author, or do you see a problem with this page? Request a review