Cited by 130Advanced Memory and Neural ComputingFerroelectric and Negative Capacitance Devices2D Materials and Applications

Giant Ferroelectric Resistance Switching Controlled by a Modulatory Terminal for Low‐Power Neuromorphic In‐Memory Computing

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Xue, Fei, He, Xin, Wang, Zhenyu, Retamal, José Ramón Durán, Chai, Zheng, Jing, Lingling, Zhang, Chenhui, Fang, Hui +8 more·2021·Advanced Materials

Abstract

Ferroelectrics have been demonstrated as excellent building blocks for high‐performance nonvolatile memories, including memristors, which play critical roles in the hardware implementation of artificial synapses and in‐memory computing. Here, it is reported that the emerging van der Waals ferroelectric α‐In 2 Se 3 can be used to successfully implement heterosynaptic plasticity (a fundamental but rarely emulated synaptic form) and achieve a resistance‐switching ratio of heterosynaptic memristors above 10 3, which is two orders of magnitude larger than that in other similar devices. The polarization change of ferroelectric α‐In 2 Se 3 channel is responsible for the resistance switching at various paired terminals. The third terminal of α‐In 2 Se 3 memristors exhibits nonvolatile control over channel current at a picoampere level, endowing the devices with picojoule read‐energy consumption to emulate the associative heterosynaptic learning. The simulation proves that both supervised and unsupervised learning manners can be implemented in α‐In 2 Se 3 neutral networks with high image recognition accuracy. Moreover, these heterosynaptic devices can naturally realize Boolean logic without an additional circuit component. The results suggest that van der Waals ferroelectrics hold great potential for applications in complex, energy‐efficient, brain‐inspired computing systems and logic‐in‐memory computers.

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  • Most studies claiming memristive ANNs only measured figures-of-merit of one or a few devices and simulated ANN accuracy via software, so the connection between fabricated memristors and the ANN is relatively weak.

    “However, most of those studies in fact only measured the figures-of-merit of one/few devices and simulated the accuracy of an ANN via software62–67 in such type of studies the connection between the memristors fabricated and the ANN is relatively weak.”
  • Some articles focused on fabrication and device-level characterization of one/few memristors also present figures-of-merit generated by a software-based training ANN process to claim that their devices exhibit potential for neuromorphic applications.

    “some articles focused on the fabrication and device-level characterization of one/few memristors62–70,186,187, also present some of the figures-of-merit generated by a software-based training ANN process (similar to the ones in Fig. 14) in order to claim that their devices exhibit potential for neuromorphic applications.”

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Research works printed but not linked: 53

  1. M. Y. Li, S. K. Su, H. S. P. Wong, L. J. Li, Nature 2019, 567, 169.
  2. Y. Shi, X. Liang, B. Yuan, V. Chen, H. Li, F. Hui, Z. Yu, F. Yuan, E. Pop, H. S. P. Wong, M. Lanza, Nat. Electron. 2018, 1, 458.
  3. S. Boyn, J. Grollier, G. Lecerf, B. Xu, N. Locatelli, S. Fusil, S. Girod, C. Carretero, K. Garcia, S. Xavier, J. Tomas, L. Bellaiche, M. Bibes, A. Barthelemy, S. Saighi, V. Garcia, Nat. Commun. 2017, 8, 14736;
  4. C. Du, W. Ma, T. Chang, P. Sheridan, W. D. Lu, Adv. Funct. Mater. 2015, 25, 4290;
  5. K. H. Kim, S. Gaba, D. Wheeler, J. M. Cruz- Albrecht, T. Hussain, N. Srinivasa, W. Lu, Nano Lett. 2012, 12, 389;
  6. T. Ohno, T. Hasegawa, T. Tsuruoka, K. Terabe, J. K. Gimzewski, M. Aono, Nat. Mater. 2011, 10, 591;
  7. Y. van de Burgt, E. Lubberman, E. J. Fuller, S. T. Keene, G. C. Faria, S. Agarwal, M. J. Marinella, A. Alec Talin, A. Salleo, Nat. Mater. 2017, 16, 414;
  8. C. Yoon, J. H. Lee, S. Lee, J. H. Jeon, J. T. Jang, D. H. Kim, Y. H. Kim, B. H. Park, Nano Lett. 2017, 17, 1949;
  9. T. Tsuruoka, T. Hasegawa, K. Terabe, M. Aono, Nanotechnology 2012, 23, 435705.
  10. S. Choi, S. H. Tan, Z. Li, Y. Kim, C. Choi, P. Y. Chen, H. Yeon, S. Yu, J. Kim, Nat. Mater. 2018, 17, 335.
  11. S. H. Jo, T. Chang, I. Ebong, B. B. Bhadviya, P. Mazumder, W. Lu, Nano Lett. 2010, 10, 1297;
  12. Z. Xiao, J. Huang, Adv. Electron. Mater. 2016, 2, 1600100.
  13. Y. Yang, B. Chen, W. D. Lu, Adv. Mater. 2015, 27, 7720.
  14. Y. Yang, M. Yin, Z. Yu, Z. Wang, T. Zhang, Y. Cai, W. D. Lu, R. Huang, Adv. Electron. Mater. 2017, 3, 1700032.
  15. S. Yu, Y. Wu, R. Jeyasingh, D. Kuzum, H. S. P. Wong, IEEE Trans. Electron Devices 2011, 58, 2729.
  16. R. Berdan, E. Vasilaki, A. Khiat, G. Indiveri, A. Serb, T. Prodromakis, Sci. Rep. 2016, 6, 18639.
  17. C. H. Bailey, M. Giustetto, Y. Y. Huang, R. D. Hawkins, E. R. Kandel, Nat. Rev. Neurosci. 2000, 1, 11.
  18. B. Gao, Y. J. Bi, H. Y. Chen, R. Liu, P. Huang, B. Chen, L. F. Liu, X. Y. Liu, S. M. Yu, H. S. P. Wong, J. F. Kang, ACS Nano 2014, 8, 6998;
  19. H. Tian, X. Cao, Y. J. Xie, X. D. Yan, A. Kostelec, D. DiMarzio, C. Chang, L. D. Zhao, W. Wu, J. Tice, J. J. Cha, J. Guo, H. Wang, ACS Nano 2017, 11, 7156;
  20. Y. F. Wang, Y. C. Lin, I. T. Wang, T. P. Lin, T. H. Hou, Sci. Rep. 2015, 5, 10150;
  21. Z. Wang, S. Joshi, S. E. Savel'ev, H. Jiang, R. Midya, P. Lin, M. Hu, N. Ge, J. P. Strachan, Z. Li, Q. Wu, M. Barnell, G. L. Li, H. L. Xin, R. S. Williams, Q. Xia, J. J. Yang, Nat. Mater. 2017, 16, 101.
  22. V. K. Sangwan, H. S. Lee, H. Bergeron, I. Balla, M. E. Beck, K. S. Chen, M. C. Hersam, Nature 2018, 554, 500.
  23. D. Ielmini, H. S. P. Wong, Nat. Electron. 2018, 1, 333.
  24. J. Borghetti, G. S. Snider, P. J. Kuekes, J. J. Yang, D. R. Stewart, R. S. Williams, Nature 2010, 464, 873.
  25. A. Chanthbouala, V. Garcia, R. O. Cherifi, K. Bouzehouane, S. Fusil, X. Moya, S. Xavier, H. Yamada, C. Deranlot, N. D. Mathur, M. Bibes, A. Barthelemy, J. Grollier, Nat. Mater. 2012, 11, 860.
  26. V. Garcia, M. Bibes, Nat. Commun. 2014, 5, 4289;
  27. D. J. Kim, H. Lu, S. Ryu, C. W. Bark, C. B. Eom, E. Y. Tsymbal, A. Gruverman, Nano Lett. 2012, 12, 5697;
  28. Z. Q. Hu, Q. Li, M. Y. Li, Q. W. Wang, Y. D. Zhu, X. L. Liu, X. Z. Zhao, Y. Liu, S. X. Dong, Appl. Phys. Lett. 2013, 102, 102901.
  29. C. Cui, W. J. Hu, X. Yan, C. Addiego, W. Gao, Y. Wang, Z. Wang, L. Li, Y. Cheng, P. Li, X. Zhang, H. N. Alshareef, T. Wu, W. Zhu, X. Pan, L. J. Li, Nano Lett. 2018, 18, 1253;
  30. F. Xue, W. Hu, K.-C. Lee, L.-S. Lu, J. Zhang, H.-L. Tang, A. Han, W.-T. Hsu, S. Tu, W.-H. Chang, C.-H. Lien, J.-H. He, Z. Zhang, L.-J. Li, X. Zhang, Adv. Funct. Mater. 2018, 28, 1803738.
  31. C. Cui, F. Xue, W.-J. Hu, L.-J. Li, npj 2D Mater. Appl. 2018, 2, 18;
  32. S. Wan, Y. Li, W. Li, X. Mao, C. Wang, C. Chen, J. Dong, A. Nie, J. Xiang, Z. Liu, W. Zhu, H. Zeng, Adv. Funct. Mater. 2019, 29, 1808606;
  33. B. Xu, H. Xiang, Y. Xia, K. Jiang, X. Wan, J. He, J. Yin, Z. Liu, Nanoscale 2017, 9, 8427;
  34. L. You, F. Liu, H. Li, Y. Hu, S. Zhou, L. Chang, Y. Zhou, Q. Fu, G. Yuan, S. Dong, H. J. Fan, A. Gruverman, Z. Liu, J. Wang, Adv. Mater. 2018, 30, 1803249;
  35. S. M. Neumayer, E. A. Eliseev, M. A. Susner, A. Tselev, B. J. Rodriguez, J. A. Brehm, S. T. Pantelides, G. Panchapakesan, S. Jesse, S. V. Kalinin, M. A. McGuire, A. N. Morozovska, P. Maksymovych, N. Balke, Phys. Rev. Mater. 2019, 3, 024401;
  36. Y. Lai, Z. Song, Y. Wan, M. Xue, C. Wang, Y. Ye, L. Dai, Z. Zhang, W. Yang, H. Du, J. Yang, Nanoscale 2019, 11, 5163.
  37. Y. Zhou, D. Wu, Y. Zhu, Y. Cho, Q. He, X. Yang, K. Herrera, Z. Chu, Y. Han, M. C. Downer, H. Peng, K. Lai, Nano Lett. 2017, 17, 5508;
  38. S. Wan, Y. Li, W. Li, X. Mao, W. Zhu, H. Zeng, Nanoscale 2018, 10, 14885.
  39. J. Xiao, H. Zhu, Y. Wang, W. Feng, Y. Hu, A. Dasgupta, Y. Han, Y. Wang, D. A. Muller, L. W. Martin, P. Hu, X. Zhang, Phys. Rev. Lett. 2018, 120, 227601.
  40. F. Xue, X. He, J. R. D. Retamal, A. Han, J. Zhang, Z. Liu, J. K. Huang, W. Hu, V. Tung, J. H. He, L. J. Li, X. Zhang, Adv. Mater. 2019, 31, 1901300.
  41. X. Yang, Y. Fang, Z. Yu, Z. Wang, T. Zhang, M. Yin, M. Lin, Y. Yang, Y. Cai, R. Huang, Nanoscale 2016, 8, 18897.
  42. S. Fujii, Y. Kamimuta, T. Ino, Y. Nakasaki, in IEEE Symp. on VLSI Technology, IEEE, Piscataway, NJ 2016;
  43. H. Zhao, Z. Dong, H. Tian, D. DiMarzi, M. G. Han, L. Zhang, X. Yan, F. Liu, L. Shen, S. J. Han, S. Cronin, W. Wu, J. Tice, J. Guo, H. Wang, Adv. Mater. 2017, 29, 1703232.
  44. G. Q. Bi, M. M. Poo, J. Neurosci. 1998, 18, 10464.
  45. C. Sung, H. Hwang, I. K. Yoo, J. Appl. Phys. 2018, 124, 151903.
  46. I. Goodfellow, D. Warde-Farley, M. Mirza, A. Courville, Y. Bengio, in Proc. of the 30th Int. Conf. on Machine Learning, Vol. 28 (Eds: D. Sanjoy, M. David), JMLR, Inc. and Microtome Publishing, USA 2013, p. 1319.
  47. L. Xu, J. S. J. Ren, C. Liu, J. Y. Jia, in Proc. of the 2014 Annual Conf. on Neural Information Processing Systems, NIPS 2014, https://papers. nips.cc/paper/2014/hash/1c1d4df596d01da60385f0bb17a4a9e0- Abstract.html.
  48. A. Krizhevsky, I. Sutskever, G. E. Hinton, Commun. ACM 2017, 60, 84;
  49. Y. Lecun, L. Bottou, Y. Bengio, P. Haffner, Proc. IEEE 1998, 86, 2278.
  50. S. Jo, W. Sun, B. Kim, S. Kim, J. Park, H. Shin, Micromachines 2019, 10, 384.
  51. Z. Wang, B. Crafton, J. Gomez, R. Xu, A. Luo, Z. Krivokapic, L. Martin, S. Datta, A. Raychowdhury, A. I. Khan, in 2018 IEEE Int. Electron Devices Meeting (IEDM), IEEE, Piscataway, NJ 2018.
  52. Z. Wang, W. Zhao, W. Kang, Y. Zhang, J.-O. Klein, D. Ravelosona, C. Chappert, Appl. Phys. Lett. 2014, 104, 053505.
  53. J. Zhou, P. Fei, Y. D. Gu, W. J. Mai, Y. F. Gao, R. Yang, G. Bao, Z. L. Wang, Nano Lett. 2008, 8, 3973.

Cited by

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Authors
Xue, F., He, X., Wang, Z., Retamal, J. R. D., Chai, Z., Jing, L., Zhang, C., Fang, H., Chai, Y., Jiang, T., Zhang, W., Alshareef, H. N., Ji, Z., Li, L., He, J., & Zhang, X.
Affiliations
  • King Abdullah University of Science and Technology (SA)
  • Shanghai Jiao Tong University (CN)
  • Liverpool John Moores University (GB)
  • Loughborough University (GB)
  • Hong Kong Polytechnic University (HK)
  • Chinese Academy of Sciences (CN)
  • UNSW Sydney (AU)
  • City University of Hong Kong (HK)
Corresponding author
  • Ji, Zhigang
  • Li, Lain‐Jong
  • He, Jr‐Hau
  • Zhang, Xixiang
Venue
Advanced Materials
Publisher
Wiley
Published
2021-04-15
Volume
33
Issue
21
Pages
e2008709-e2008709
ISSN
  • 0935-9648 (ISSN-L)
  • 1521-4095
OpenAlex
W3134836631
Cited by
130
References
55
Citations by year
2026: 14 · 2025: 25 · 2024: 25 · 2023: 33 · 2022: 26 · 2021: 7
FWCI
6.69
Type
journal article
Language
en
Open access
Locations
  • Advanced Materials (publishedVersion, cc-by)
  • PubMed (publishedVersion)
  • Liverpool John Moores University (submittedVersion)
  • Figshare (submittedVersion, cc-by-nc-nd)
  • King Abdullah University of Science and Technology Repository (King Abdullah University of Science and Technology) (submittedVersion)
Funders
  • King Abdullah University of Science and Technology
  • City University of Hong Kong
Topics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced Memory and Neural Computing
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Ferroelectric and Negative Capacitance Devices
  • Physical Sciences › Materials Science › Materials Chemistry › 2D Materials and Applications
Keywords
α-In2Se3, van der Waals ferroelectrics, heterosynaptic plasticity, memristors, in-memory computing, neuromorphic computing, artificial synapses, associative learning, Boolean logic, low-power neural networks, image recognition, non-volatile memory

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