The DOI matches its Crossref record; 5 of the 5 references it cites were found in a registry or an index.
Chemical Amplification Resists for Microlithography
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Citations
Cites
MURPHY, W. J. (1956) · Chemical & Engineering News Archive · doi:10.1021/cen-v034n034.p4017 · Cited by 3,147
Moore's law: past, present and future
Schaller, R. R. (1997) · IEEE Spectrum · doi:10.1109/6.591665 · Cited by 1,914
Semiconductor Lithography: Principles, Practices, and Materials
Moreau, W. M. (1988) · Springer eBooks · doi:10.1007/978-1-4613-0885-0 · Cited by 394
Diazonaphthoquinone-based Resists
Dammel, R. R. (1993) · SPIE eBooks · doi:10.1117/3.2265072 · Cited by 163
Chemical amplification resists: History and development within IBM
Ito, H. (2000) · IBM Journal of Research and Development · doi:10.1147/rd.441.0119 · Cited by 92
Self-citation
Cited by
Fabrication Approaches for Generating Complex Micro- and Nanopatterns on Polymeric Surfaces
del Campo, A., & Arzt, E. (2008) · Chemical Reviews · doi:10.1021/cr050018y · Cited by 484
Pyzer-Knapp, E. O., Pitera, J. W., Staar, P. W. J., Takeda, S., Laino, T., Sanders, D. P., Sexton, J., Smith, J. R., & Curioni, A. (2022) · npj Computational Materials · doi:10.1038/s41524-022-00765-z · Cited by 465
Chatani, S., Kloxin, C. J., & Bowman, C. N. (2014) · Polym. Chem. · doi:10.1039/c3py01334k · Cited by 408
Radiation Chemistry in Chemically Amplified Resists
Kozawa, T., & Tagawa, S. (2010) · Japanese Journal of Applied Physics · doi:10.1143/jjap.49.030001 · Cited by 360
Directed self-assembly of block copolymers for next generation nanolithography
Jeong, S.-J., Kim, J. Y., Kim, B. H., Moon, H.-S., & Kim, S. O. (2013) · Materials Today · doi:10.1016/j.mattod.2013.11.002 · Cited by 306
Advances in Patterning Materials for 193 nm Immersion Lithography
Sanders, D. P. (2010) · Chemical Reviews · doi:10.1021/cr900244n · Cited by 290
Ultrahigh-printing-speed photoresists for additive manufacturing
Liu, T., Tao, P., Wang, X., Wang, H., He, M., Wang, Q., Cui, H., Wang, J., Tang, Y., Tang, J., et al. (2024) · Nature Nanotechnology · doi:10.1038/s41565-023-01517-w · Cited by 63
Evolution of patterning materials towards the Moore’s Law 2.0 Era
Goldfarb, D. L. (2022) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/ac5534 · Cited by 47
Acid-diffusion behaviour in organic thin films and its effect on patterning
Lee, J.-K., Chatzichristidi, M., Zakhidov, A. A., Hwang, H. S., Schwartz, E. L., Sha, J., Taylor, P. G., Fong, H. H., DeFranco, J. A., Murotani, E., et al. (2009) · Journal of Materials Chemistry · doi:10.1039/b817286b · Cited by 25
Toriumi, M., Sato, Y., Koshino, M., Suenaga, K., & Itani, T. (2016) · Applied Physics Express · doi:10.7567/apex.9.031601 · Cited by 22
Park, J. Y., Song, H.-J., Nguyen, T. C., Son, W.-J., Kim, D., Song, G., Hong, S.-K., Go, H., Park, C., Jang, I., et al. (2023) · Molecules · doi:10.3390/molecules28176244 · Cited by 9
Biradar, M. R., Sagdic, G., Yuan, C., Marui, R., & Ober, C. K. (2026) · Chemical Reviews · doi:10.1021/acs.chemrev.5c01043 · Cited by 6
Robinson, A. P. G., & Lawson, R. A. (2016) · Frontiers of Nanoscience · doi:10.1016/b978-0-08-100354-1.00013-2 · Cited by 4
Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography †
Li, H., Peng, R., Liu, Z., Lian, P., Chen, J., Yu, T., Zeng, Y., Wang, S., Guo, X., Hu, R., et al. (2026) · Chinese Journal of Chemistry · doi:10.1002/cjoc.70573 · Cited by 2
PFAS free chemically amplified resists enabled by low activation energy hydrocarbon cage monomers
Liu, Y., Summersgill, M. D., Cheng, H.-H., Chow, S., Im, E., Du, Y., Xing, H., Houston, S. D., Nielsen, B., Whittaker, A. K., et al. (2026) · Chemical Science · doi:10.1039/d6sc03643k
Metadata
- Authors
- Ito, H.
- Venue
- Advances in Polymer Science
- Publisher
- Springer Berlin Heidelberg
- Published
- 2005-02-03
- Pages
- 37-245
- ISSN
- 0065-3195 (ISSN-L)
- 1436-5030
- OpenAlex
- W2486119844
- Cited by
- 428
- References
- 5
- FWCI
- 145.43
- Type
- book chapter
- Language
- en
- Open access
- closed
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Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
