The DOI matches its Crossref record; 59 of the 59 references it cites were found in a registry or an index.
Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography
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“Directed self-assembly (DSA) has been around for many years 125 .”
From Extreme ultraviolet lithography (2024) · cites this paper as [125]
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Cites
Cramming More Components Onto Integrated Circuits
Moore, G. E. (1998) · Proceedings of the IEEE · doi:10.1109/jproc.1998.658762 · Cited by 5,954
Structure and growth of self-assembling monolayers
Schreiber, F. (2000) · Progress in Surface Science · doi:10.1016/s0079-6816(00)00024-1 · Cited by 2,536
A brief review of atomic layer deposition: from fundamentals to applications
Johnson, R. W., Hultqvist, A., & Bent, S. F. (2014) · Materials Today · doi:10.1016/j.mattod.2014.04.026 · Cited by 2,024
Moore's law: past, present and future
Schaller, R. R. (1997) · IEEE Spectrum · doi:10.1109/6.591665 · Cited by 1,931
Why is anatase a better photocatalyst than rutile? - Model studies on epitaxial TiO2 films
Luttrell, T., Halpegamage, S., Tao, J., Kramer, A. R., Sutter, E., & Batzill, M. (2014) · Scientific Reports · doi:10.1038/srep04043 · Cited by 1,548
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
Mackus, A. J. M., Merkx, M. J. M., & Kessels, W. M. M. (2018) · Chemistry of Materials · doi:10.1021/acs.chemmater.8b03454 · Cited by 440
Extreme ultraviolet resist materials for sub-7 nm patterning
Li, L., Liu, X., Pal, S., Wang, S., Ober, C. K., & Giannelis, E. P. (2017) · Chemical Society Reviews · doi:10.1039/c7cs00080d · Cited by 350
Semiconductor Nanowire Fabrication by Bottom-Up and Top-Down Paradigms
Hobbs, R. G., Petkov, N., & Holmes, J. D. (2012) · Chemistry of Materials · doi:10.1021/cm300570n · Cited by 318
Effect of brookite phase on the anatase–rutile transition in titania nanoparticles
Hu, Y. T., Tsai, H.-L., & Huang, C.-S. (2002) · Journal of the European Ceramic Society · doi:10.1016/s0955-2219(02)00194-2 · Cited by 314
Surface energy and wettability of van der Waals structures
Annamalai, M., Gopinadhan, K., Han, S. A., et al. (2016) · Nanoscale · doi:10.1039/c5nr06705g · Cited by 252
Cited by
Sorted by citations
Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149
Resistless EUV lithography: Photon-induced oxide patterning on silicon
Tseng, L.-T., Karadan, P., Kazazis, D., Constantinou, P. C., Stock, T. J. Z., Curson, N. J., Schofield, S. R., Muntwiler, M., Aeppli, G., & Ekinci, Y. (2023) · Science Advances · doi:10.1126/sciadv.adf5997 · Cited by 34
Metadata
- Authors
- Lodha, J. K., Pollentier, I., Conard, T., Vallat, R., De Gendt, S., & Armini, S.
- Affiliations
- IMEC (BE)
- Corresponding author
- Armini, Silvia
- Venue
- Applied Surface Science
- Publisher
- Elsevier BV
- Published
- 2022-12
- Volume
- 606
- Pages
- 154657
- ISSN
- 0169-4332 (ISSN-L)
- OpenAlex
- W4293879836
- Cited by
- 16
- References
- 59
- Citations by year
- 2026: 2 · 2025: 3 · 2024: 6 · 2023: 5
- FWCI
- 0.96
- Type
- journal article
- Language
- en
- Open access
- bronze
- doi.org
- Licence
- Locations
- Applied Surface Science (publishedVersion)
- Lirias (submittedVersion, other-oa)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Nanofabrication and Lithography Techniques
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Semiconductor materials and devices
- Keywords
- self-assembled monolayers, area-selective deposition, EUV lithography, titanium oxide, photocatalysis, organosilane monolayers, chain length effects, atomic layer deposition, bottom-up nanofabrication
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