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Cited by 733

The DOI matches its Crossref record; 41 of the 41 references it cites were found in a registry or an index.

Recent progress in nanoimprint technology and its applications

Open access
Guo, L Jay·2004·Journal of Physics D: Applied Physics

Abstract

Nanoimprint is an emerging lithographic technology that promises high-throughput patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffractions or beam scatterings in other conventional techniques. This article reviews the basic principles of nanoimprint technology and some of the recent progress in this field. It also explores a few alternative approaches that are related to nanoimprint as well as additive approaches for patterning polymer structures. Nanoimprint technology can not only create resist patterns as in lithography but can also imprint functional device structures in polymers. This property is exploited in several non-traditional microelectronic applications in the areas of photonics and biotechnology.

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Crossref · 10.1088/0022-3727/37/11/r01

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Metadata

Authors
Guo, L. J.
Venue
Journal of Physics D: Applied Physics
Published
2004-05-13
Volume
37
Issue
11
Pages
R123-R141
ISSN
  • 0022-3727 (ISSN-L)
  • 1361-6463
OpenAlex
W2049736064
Cited by
733
References
41
FWCI
36.34
Type
journal article
Language
en
Open access
bronze

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CoChat. (2026). Citation check: Recent progress in nanoimprint technology and its applications. https://app.cochat.ai/papers/10.1088/0022-3727/37/11/r01
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Guo, L. J. (2004). Recent progress in nanoimprint technology and its applications. Journal of Physics D: Applied Physics. https://doi.org/10.1088/0022-3727/37/11/r01

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.