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Cited by 201

The DOI matches its Crossref record; 8 of the 8 references it cites were found in a registry or an index.

Effects of surface roughness and oxide layer on the thermal boundary conductance at aluminum/silicon interfaces

Hopkins, Patrick E., Phinney, Leslie M., Serrano, Justin R., Beechem, Thomas E.·2010·Physical Review B

Abstract

In nanosystems, the primary scattering mechanisms occur at the interfaces between the material layers. As such, the structure and composition around these interfaces can affect scattering rates and, therefore, thermal resistances. In this work, we measure the room-temperature thermal boundary conductance of aluminum films grown on silicon substrates subjected to various pre-Al-deposition surface treatments with a pump-probe thermoreflectance technique. The Si surfaces are characterized with atomic force microscopy to determine mean surface roughness. The measured thermal boundary conductances decrease as Si surface roughness increases. In addition, stripping of the native oxide layer from the surface of the Si substrate immediately prior to Al film deposition causes the thermal boundary conductance to increase. The measured data are compared to an extension of the diffuse mismatch model that accounts for interfacial mixing and structure around the interface in order to better elucidate the thermal scattering processes affecting thermal boundary conductance at rough interfaces.

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Metadata

Authors
Hopkins, P. E., Phinney, L. M., Serrano, J. R., & Beechem, T. E.
Venue
Physical Review B
Published
2010-08-05
Volume
82
Issue
8
ISSN
  • 1098-0121 (ISSN-L)
  • 1550-235X
OpenAlex
W2068798373
Cited by
201
References
8
FWCI
5.41
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Effects of surface roughness and oxide layer on the thermal boundary conductance at aluminum/silicon interfaces. https://app.cochat.ai/papers/10.1103/physrevb.82.085307
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Hopkins, P. E., Phinney, L. M., Serrano, J. R., & Beechem, T. E. (2010). Effects of surface roughness and oxide layer on the thermal boundary conductance at aluminum/silicon interfaces. Physical Review B. https://doi.org/10.1103/physrevb.82.085307

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