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Temperature dependence of Fowler-Nordheim current in 6H- and 4H-SiC MOS capacitors

Agarwal, A.K., Seshadri, S., Rowland, L.B.·1997·IEEE Electron Device Letters

Abstract

This work reports on Fowler-Nordheim (F-N) injection studies on n-type 6H-SiC and 4H-SiC MOS systems under positive gate bias from 25 to 325/spl deg/C. At a given temperature and electric field, the current density in the 4H-SiC MOS system is about five times higher than that in 6H-SiC due to the smaller effective barrier height for the 4H-SiC MOS system as compared to 6H-SiC. The reduction of the effective barrier height with temperature, particularly in 4H-SiC, raises serious concerns about the long-term reliability of gate oxides in SiC. It is concluded that the maximum practical values of electric field in the 4H-SiC MOS system under positive gate bias and high junction temperature should be reduced to below the values used in the Si MOS system.

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Metadata

Authors
Agarwal, A. K., Seshadri, S., & Rowland, L. B.
Venue
IEEE Electron Device Letters
Published
1997-12
Volume
18
Issue
12
Pages
592-594
ISSN
  • 0741-3106 (ISSN-L)
  • 1558-0563
OpenAlex
W2156650445
Cited by
199
References
0
FWCI
10.55
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Temperature dependence of Fowler-Nordheim current in 6H- and 4H-SiC MOS capacitors. https://app.cochat.ai/papers/10.1109/55.644081
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Agarwal, A. K., Seshadri, S., & Rowland, L. B. (1997). Temperature dependence of Fowler-Nordheim current in 6H- and 4H-SiC MOS capacitors. IEEE Electron Device Letters. https://doi.org/10.1109/55.644081

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