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Cited by 367

The DOI matches its Crossref record; 7 of the 7 references it cites were found in a registry or an index.

1200-V Normally Off GaN-on-Si Field-Effect Transistors With Low Dynamic on -Resistance

Rongming Chu, Corrion, A, Chen, M, Ray Li, Wong, D, Zehnder, D, Hughes, B, Boutros, K·2011·IEEE Electron Device Letters

Abstract

This letter reports high-voltage GaN field-effect transistors fabricated on Si substrates. A halide-based plasma treatment was performed to enable normally off operation. Atomic layer deposition of Al2O3gate insulator was adopted to reduce the gate leakage current. Incorporation of multiple field plates, with one field plate connected to the gate electrode and two field plates connected to the source electrode successfully enabled a high breakdown voltage of 1200 V and low dynamic on-resistance at high-voltage operation.

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Crossref · 10.1109/led.2011.2118190

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Metadata

Authors
Chu, R., Corrion, A., Chen, M., Li, R., Wong, D., Zehnder, D., Hughes, B., & Boutros, K.
Venue
IEEE Electron Device Letters
Published
2011-05
Volume
32
Issue
5
Pages
632-634
ISSN
  • 0741-3106 (ISSN-L)
  • 1558-0563
OpenAlex
W2159764454
Cited by
367
References
7
FWCI
22.45
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: 1200-V Normally Off GaN-on-Si Field-Effect Transistors With Low Dynamic on -Resistance. https://app.cochat.ai/papers/10.1109/led.2011.2118190
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Chu, R., Corrion, A., Chen, M., Li, R., Wong, D., Zehnder, D., Hughes, B., & Boutros, K. (2011). 1200-V Normally Off GaN-on-Si Field-Effect Transistors With Low Dynamic on -Resistance. IEEE Electron Device Letters. https://doi.org/10.1109/led.2011.2118190

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.