Cited by 353Thermal properties of materialsMetal and Thin Film MechanicsThermal Radiation and Cooling Technologies

Ultra-Low Thermal Conductivity in W/Al 2 O 3 Nanolaminates

Costescu, R. M., Cahill, D. G., Fabreguette, F. H., Sechrist, Z. A., George, S. M.·2004·Science

Abstract

Atomic layer deposition and magnetron sputter deposition were used to synthesize thin-film multilayers of W/Al 2 O 3 . With individual layers only a few nanometers thick, the high interface density produced a strong impediment to heat transfer, giving rise to a thermal conductivity of ∼0.6 watts per meter per kelvin. This result suggests that high densities of interfaces between dissimilar materials may provide a route for the production of thermal barriers with ultra-low thermal conductivity.

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Crossref · 10.1126/science.1093711

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1 of 1 references verified0 citation errors · 0 not checkable

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Authors
Costescu, R. M., Cahill, D. G., Fabreguette, F. H., Sechrist, Z. A., & George, S. M.
Affiliations
University of Illinois Urbana-Champaign (US)
Corresponding author
Cahill, D. G.
Venue
Science
Published
2004-02-13
Volume
303
Issue
5660
Pages
989-990
ISSN
  • 0036-8075 (ISSN-L)
  • 1095-9203
OpenAlex
W2019414150
Cited by
353
References
1
Citations by year
2026: 5 · 2025: 9 · 2024: 7 · 2023: 7 · 2022: 20 · 2021: 18 · 2020: 21 · 2019: 15 · 2018: 24 · 2017: 15 · 2016: 23 · 2015: 28 · 2014: 18 · 2013: 28 · 2012: 19
FWCI
6.87
Type
journal article
Language
en
Open access
closed
Locations
  • Science (publishedVersion)
  • PubMed (publishedVersion)
Topics
  • Physical Sciences › Materials Science › Materials Chemistry › Thermal properties of materials
  • Physical Sciences › Engineering › Mechanics of Materials › Metal and Thin Film Mechanics
  • Physical Sciences › Engineering › Civil and Structural Engineering › Thermal Radiation and Cooling Technologies
Keywords
tungsten, alumina, thermal barrier coatings, interface scattering, heat transfer, atomic layer deposition, magnetron sputtering, multilayer films, thermal insulation

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