High speed resistive switching in Pt∕TiO2∕TiN film for nonvolatile memory application
Abstract
We have fabricated and investigated the bipolar resistive switching characteristics of Pt/rutile-TiO2∕TiN devices for resistance memory applications. Data writing for five-level resistance states has been demonstrated by varying the amplitude of 5ns voltage pulses. In addition, data retention of more than 256h at 85°C and an excellent endurance of over 2×106cycles have been confirmed. These results indicate that Pt∕TiO2∕TiN devices have a potential for nonvolatile multiple-valued memory devices.
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For memristors, SET and RESET switching speeds have been observed in the single digit nanosecond range by several groups.
“For memristors, switching speeds for the SET operation (ON switching), from the high resistance state (HRS) to the low resistance state (LRS), as well as for the RESET operation (OFF switching), from the LRS to the HRS, have been observed in the single digit nanosecond range by several groups [14][15][16][17].”
From Sub-nanosecond switching of a tantalum oxide memristor (2011) · cites this paper as [15]
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Low power multi-level-cell resistive memory design with incomplete data mapping
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“Various materials, including TiOx [27], HfOx [19], as well as TaOx [22], have already shown their feasibility as the switching materials of MLC ReRAM.”
BackgroundMemristors With Flexible Electronic Applications
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“ducting filaments by the Joule heating effect [42], [43].”
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Unipolar resistive switching in CoFeB∕MgO∕CoFeB magnetic tunnel junction
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Self-citationEngineering oxide resistive switching materials for memristive device application
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“Many materials, such as Al2O3 [1], TiO2 [2], [3], HfO2 [4], [5], Ta2O5 [6], [7], Nb2O5 [8], and ZnO [9] have been tested for RRAM applications.”
An Electrical Characterisation Methodology for Benchmarking Memristive Device Technologies
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Resistive switching properties and low resistance state relaxation in Al/Pr0.7Ca0.3MnO3/Pt junctions
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Titanium nanotubes grown by titanium anodization
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Nanoionic devices: Interface nanoarchitechtonics for physical property tuning and enhancement
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Electronic structure and stability of low symmetry Ta2O5polymorphs
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- Authors
- Yoshida, C., Tsunoda, K., Noshiro, H., & Sugiyama, Y.
- Affiliations
- Fujitsu (Japan) (JP)
- ORCID
- Yoshida, Chikako
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 2007-11-26
- Volume
- 91
- Issue
- 22
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W2074429207
- Cited by
- 271
- References
- 7
- Citations by year
- 2026: 3 · 2025: 3 · 2024: 4 · 2023: 11 · 2022: 13 · 2021: 6 · 2020: 6 · 2019: 12 · 2018: 21 · 2017: 19 · 2016: 19 · 2015: 5 · 2014: 23 · 2013: 24 · 2012: 21
- FWCI
- 14.50
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Applied Physics Letters (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced Memory and Neural Computing
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Ferroelectric and Negative Capacitance Devices
- Physical Sciences › Materials Science › Materials Chemistry › Phase-change materials and chalcogenides
- Keywords
- resistive switching, non-volatile memory, bipolar resistive switching, multilevel memory, data retention, endurance, high-speed switching, rutile TiO2, metal-insulator-metal devices
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