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High speed resistive switching in Pt∕TiO2∕TiN film for nonvolatile memory application
Abstract
We have fabricated and investigated the bipolar resistive switching characteristics of Pt/rutile-TiO2∕TiN devices for resistance memory applications. Data writing for five-level resistance states has been demonstrated by varying the amplitude of 5ns voltage pulses. In addition, data retention of more than 256h at 85°C and an excellent endurance of over 2×106cycles have been confirmed. These results indicate that Pt∕TiO2∕TiN devices have a potential for nonvolatile multiple-valued memory devices.
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“For memristors, switching speeds for the SET operation (ON switching), from the high resistance state (HRS) to the low resistance state (LRS), as well as for the RESET operation (OFF switching), from the LRS to the HRS, have been observed in the single digit nanosecond range by several groups [14][15][16][17].”
From Sub-nanosecond switching of a tantalum oxide memristor (2011) · cites this paper as [15]
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Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition
Choi, B. J., Jeong, D. S., Kim, S. K., Rohde, C., Choi, S. M., Oh, J. H., Kim, H. J., Hwang, C. S., Szot, K., Waser, R. M., et al. (2005) · Journal of Applied Physics · doi:10.1063/1.2001146 · Cited by 1,149
Reproducible resistance switching in polycrystalline NiO films
Seo, S., Lee, M., Seo, D. H., Jeoung, E. J., Suh, D., Joung, Y. S., Yoo, I. K., Hwang, I. R., Kim, S. H., Byun, I.-S., et al. (2004) · Applied Physics Letters · doi:10.1063/1.1831560 · Cited by 932
Fujii, T., Kawasaki, M., Sawa, A., Akoh, H., Kawazoe, Y., & Tokura, Y. (2004) · Applied Physics Letters · doi:10.1063/1.1845598 · Cited by 359
Identification of a determining parameter for resistive switching of TiO2 thin films
Rohde, C., Choi, B. J., Jeong, D. S., Choi, S., Zhao, J., & Hwang, C. S. (2005) · Applied Physics Letters · doi:10.1063/1.1968416 · Cited by 333
Ti O 2 anatase nanolayer on TiN thin film exhibiting high-speed bipolar resistive switching
Fujimoto, M., Koyama, H., Konagai, M., Hosoi, Y., Ishihara, K., Ohnishi, S., & Awaya, N. (2006) · Applied Physics Letters · doi:10.1063/1.2397006 · Cited by 221
Sato, Y., Kinoshita, K., Aoki, M., & Sugiyama, Y. (2007) · Applied Physics Letters · doi:10.1063/1.2431792 · Cited by 116
Self-citationStudy on the resistive switching time of TiO2 thin films
Choi, B. J., Choi, S., Kim, K. M., Shin, Y. C., Hwang, C. S., Hwang, S.-Y., Cho, S., Park, S., & Hong, S.-K. (2006) · Applied Physics Letters · doi:10.1063/1.2219726 · Cited by 116
Research works printed but not linked: 2
- 2006, Jpn. J. Appl. Phys., Part 2, 45, L312
- Tech. Dig. - Int. Electron Devices Meet., 2006, 793
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Wong, H.-S. P., Lee, H.-Y., Yu, S., Chen, Y.-S., Wu, Y., Chen, P.-S., Lee, B., Chen, F. T., & Tsai, M.-J. (2012) · Proceedings of the IEEE · doi:10.1109/jproc.2012.2190369 · Cited by 2,757
Pan, F., Gao, S., Chen, C., Song, C., & Zeng, F. (2014) · Materials Science and Engineering R Reports · doi:10.1016/j.mser.2014.06.002 · Cited by 1,412
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Jeong, D. S., Thomas, R., Katiyar, R. S., Scott, J. F., Kohlstedt, H., Petraru, A., & Hwang, C. S. (2012) · Reports on Progress in Physics · doi:10.1088/0034-4885/75/7/076502 · Cited by 1,099
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Akinaga, H., & Shima, H. (2010) · Proceedings of the IEEE · doi:10.1109/jproc.2010.2070830 · Cited by 1,037
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Heremans, P. L., Gelinck, G. H., Müller, R., Baeg, K.-J., Kim, D., & Noh, Y. (2010) · Chemistry of Materials · doi:10.1021/cm102006v · Cited by 541
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Lee, J. S., Lee, S., & Noh, T. W. (2015) · Applied Physics Reviews · doi:10.1063/1.4929512 · Cited by 462
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Stathopoulos, S., Khiat, A., Trapatseli, M., Cortese, S., Serb, A., Valov, I., & Prodromakis, T. (2017) · Scientific Reports · doi:10.1038/s41598-017-17785-1 · Cited by 312
Adaptive oxide electronics: A review
Ha, S. D., & Ramanathan, S. (2011) · Journal of Applied Physics · doi:10.1063/1.3640806 · Cited by 308
Wang, Y., Liu, Q., Long, S., Wang, W., Wang, Q., Zhang, M., Zhang, S., Li, Y., Zuo, Q., Yang, J., et al. (2009) · Nanotechnology · doi:10.1088/0957-4484/21/4/045202 · Cited by 307
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Hong, X., Loy, D. J., Dananjaya, P. A., Tan, F., Ng, C., & Lew, W. S. (2018) · Journal of Materials Science · doi:10.1007/s10853-018-2134-6 · Cited by 307
“201103723 [189] Yoshida C, Tsunoda K, Noshiro H, Sugiyama Y (2007) High speed resistive switching in Pt/TiO2/TiN film for nonvolatile memory application.”
BackgroundPolymer memristor for information storage and neuromorphic applications
Chen, Y., Liu, G., Wang, C., Zhang, W., Li, R., & Wang, L. (2014) · Materials Horizons · doi:10.1039/c4mh00067f · Cited by 289
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Takagi, H., & Hwang, H. Y. (2010) · Science · doi:10.1126/science.1182541 · Cited by 290
Standards for the Characterization of Endurance in Resistive Switching Devices
Lanza, M., Waser, R. M., Ielmini, D., Yang, J. J., Goux, L., Suñé, J., Kenyon, A. J., Mehonić, A., Spiga, S., Rana, V., et al. (2021) · ACS Nano · doi:10.1021/acsnano.1c06980 · Cited by 272
Chen, M.-C., Chang, T., Tsai, C.-T., Huang, S.-Y., Chen, S.-C., Hu, C., Sze, S. M., & Tsai, M. (2010) · Applied Physics Letters · doi:10.1063/1.3456379 · Cited by 191
Nanoscale resistive memory with intrinsic diode characteristics and long endurance
Kim, K.-H., Hyun Jo, S., Gaba, S., & Lu, W. (2010) · Applied Physics Letters · doi:10.1063/1.3294625 · Cited by 187
Device and materials requirements for neuromorphic computing
Islam, R., Li, H., Chen, P.-Y., Wan, W., Chen, H.-Y., Gao, B., Wu, H., Yu, S., Saraswat, K. C., & Wong, H. ‐. P. (2018) · Journal of Physics D Applied Physics · doi:10.1088/1361-6463/aaf784 · Cited by 161
“CuxO [59], TiOx [60], HfOx [61], WOx [62] and TaOx [63].”
BackgroundInfluentialXu, J., Zhao, X., Wang, Z., Xu, H., Hu, J., Ma, J., & Liu, Y. (2018) · Small · doi:10.1002/smll.201803970 · Cited by 153
Bae, Y. C., Lee, A. R., Lee, J. B., Koo, J. H., Kwon, K. C., Park, J. G., Im, H. S., & Hong, J. P. (2011) · Advanced Functional Materials · doi:10.1002/adfm.201102362 · Cited by 140
Yu, S., Gao, B., Dai, H., Sun, B., Liu, L., Liu, X., Han, R., Kang, J., & Yu, B. (2009) · Electrochemical and Solid-State Letters · doi:10.1149/1.3267050 · Cited by 137
Low‐Power High‐Performance Non‐Volatile Memory on a Flexible Substrate with Excellent Endurance
Cheng, C., Yeh, F.-S., & Chin, A. (2010) · Advanced Materials · doi:10.1002/adma.201002946 · Cited by 136
Physical Mechanism and Performance Factors of Metal Oxide Based Resistive Switching Memory: A Review
Ye, C., Wu, J., He, G., Zhang, J., Deng, T., Pin, H., & Wang, H. (2015) · Journal of Material Science and Technology · doi:10.1016/j.jmst.2015.10.018 · Cited by 137
Understanding the trade-offs in multi-level cell ReRAM memory design
Xu, C., Niu, D., Muralimanohar, N., Jouppi, N. P., & Xie, Y. (2013) · ACM/IEEE Design Automation Conference (DAC) · doi:10.1145/2463209.2488867 · Cited by 129
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BackgroundInfluentialA journey towards reliability improvement of TiO2 based Resistive Random Access Memory: A review
Acharyya, D., Hazra, A., & Bhattacharyya, P. (2014) · Microelectronics Reliability · doi:10.1016/j.microrel.2013.11.013 · Cited by 128
“[62] reported that the compliance current during ‘set’ and ‘reset’ process in bipolar resistive switching are typically 10–200 times smaller than that of in unipolar switching.”
BackgroundInfluentialNinomiya, T., Wei, Z., Muraoka, S., Yasuhara, R., Katayama, K., & Takagi, T. (2013) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2013.2248157 · Cited by 123
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BackgroundMesserschmitt, F., Kubicek, M., Schweiger, S., & Rupp, J. L. M. (2014) · Advanced Functional Materials · doi:10.1002/adfm.201402286 · Cited by 115
Terai, M., Sakotsubo, Y., Kotsuji, S., & Hada, H. (2010) · IEEE Electron Device Letters · doi:10.1109/led.2009.2039021 · Cited by 106
“Multilevel storage can increase the data density efficiently and reduce the process cost of ReRAM [6], [7].”
BackgroundZhang, W., Kong, J., Cao, Z., Li, A., Wang, L.-G., Zhu, L. S., Li, X., Cao, Y., & Wu, D. (2017) · Nanoscale Research Letters · doi:10.1186/s11671-017-2164-z · Cited by 105
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Yasuhara, R., Fujiwara, K., Horiba, K., Kumigashira, H., Kotsugi, M., Oshima, M., & Takagi, H. (2009) · Applied Physics Letters · doi:10.1063/1.3175720 · Cited by 101
Lin, Y., Zeng, F., Tang, S., Liu, H. Y., Chen, C., Gao, S., Wang, Y. G., & Pan, F. (2013) · Journal of Applied Physics · doi:10.1063/1.4791695 · Cited by 99
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Sun, B., Liu, Y. X., Liu, L. F., Xu, N., Ying-Ming, W. A. N. G., Liu, X. Y., Han, R. Q., & Kang, J. (2009) · Journal of Applied Physics · doi:10.1063/1.3055414 · Cited by 97
Khan, R., Rehman, N. U., Iqbal, S., Abdullaev, S. S., & Aldosari, H. M. (2023) · ACS Applied Electronic Materials · doi:10.1021/acsaelm.3c01323 · Cited by 99
Yoon, J., Choi, H., Lee, D., Park, J., Lee, J., Seong, D.-J., Ju, Y., Chang, M., Jung, S., & Hwang, H. (2009) · IEEE Electron Device Letters · doi:10.1109/led.2009.2015687 · Cited by 94
“memory (NVM) devices due to its scalability, fast switching speed, and nondestructive readouts [1]–[3].”
BackgroundShima, H., Takano, F., Muramatsu, H., Akinaga, H., Tamai, Y., Inque, I. H., & Takagi, H. (2008) · Applied Physics Letters · doi:10.1063/1.2982426 · Cited by 94
Kim, K. M., Song, S. J., Kim, G. H., Seok, J. Y., Lee, M. H., Yoon, J. H., Park, J., & Hwang, C. S. (2011) · Advanced Functional Materials · doi:10.1002/adfm.201002282 · Cited by 89
Jang, M. H., Agarwal, R., Nukala, P., Choi, D., Johnson, A. T. C., Chen, I., & Agarwal, R. (2016) · Nano Letters · doi:10.1021/acs.nanolett.5b02951 · Cited by 87
Tian, J., Wu, H., Fan, Z. H., Zhang, Y., Pennycook, S. J., Zheng, D., Tan, Z., Guo, H., Yu, P., Lu, X., et al. (2019) · Advanced Materials · doi:10.1002/adma.201903679 · Cited by 86
Xiao, N., Villena, M. A., Yuan, B., Chen, S., Wang, B., Eliáš, M., Shi, Y., Hui, F., Jing, X., Scheuermann, A. G., et al. (2017) · Advanced Functional Materials · doi:10.1002/adfm.201700384 · Cited by 80
Memristive devices in computing system
Yang, J. J., & Williams, R. S. (2013) · ACM Journal on Emerging Technologies in Computing Systems · doi:10.1145/2463585.2463587 · Cited by 78
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BackgroundRealization of forming-free ZnO-based resistive switching memory by controlling film thickness
Mao, Q., Ji, Z., & Xi, J. (2010) · Journal of Physics D Applied Physics · doi:10.1088/0022-3727/43/39/395104 · Cited by 77
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Kazi, I., Meinerzhagen, P., Gaillardon, P., Sacchetto, D., Leblebici, Y., Burg, A. P., & Micheli, G. D. (2014) · IEEE Transactions on Circuits and Systems I Regular Papers · doi:10.1109/tcsi.2014.2334891 · Cited by 76
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BackgroundCao, X., Li, X., Gao, X., Liu, X., Yang, C. S., Yang, R., & Jin, P. (2011) · Journal of Physics D Applied Physics · doi:10.1088/0022-3727/44/25/255104 · Cited by 75
To the Issue of the Memristor’s HRS and LRS States Degradation and Data Retention Time
Фадеев, А. В., & Rudenko, K. V. (2021) · Russian Microelectronics · doi:10.1134/s1063739721050024 · Cited by 77
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Hwang, I., Lee, M.-J., Buh, G.-H., Bae, J., Choi, J. S., Kim, J.-S., Hong, S., Kim, Y. S., Byun, I.-S., Lee, S.-W., et al. (2010) · Applied Physics Letters · doi:10.1063/1.3477953 · Cited by 72
Tang, G., Zeng, F., Chen, C., Liu, H., Gao, S., Song, C., Lin, Y., Chen, G., & Pan, F. (2012) · Nanoscale · doi:10.1039/c2nr32743k · Cited by 72
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Bogle, K. A., Bachhav, M. N., Deo, M. S., Nagarajan, V., & Ogale, S. (2009) · Applied Physics Letters · doi:10.1063/1.3263713 · Cited by 71
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He, W., Sun, H., Zhou, Y., Lu, K., Xue, K., & Miao, X. (2017) · Scientific Reports · doi:10.1038/s41598-017-09413-9 · Cited by 70
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Vidiš, M., Pleceník, T., Moško, M., Tomašec, S., Roch, T., Satrapinskyy, L., Grančič, B., & Plecenik, A. (2019) · Applied Physics Letters · doi:10.1063/1.5099685 · Cited by 69
HfO x /AlO y Superlattice‐Like Memristive Synapse
Wang, C., Mao, G., Huang, M., Huang, E., Zhang, Z., Yuan, J., Cheng, W., Xue, K., Wang, X., & Miao, X. (2022) · Advanced Science · doi:10.1002/advs.202201446 · Cited by 70
Multilevel resistive switching memory with amorphous InGaZnO-based thin film
Hsu, C.-H., Fan, Y., & Liu, P. (2013) · Applied Physics Letters · doi:10.1063/1.4792316 · Cited by 67
Noman, M., Jiang, W., Salvador, P. A., Skowroński, M., & Bain, J. A. (2011) · Applied Physics A · doi:10.1007/s00339-011-6270-y · Cited by 64
Alivov, Y., Pandikunta, M., Nikishin, S. A., & Fan, Z. (2009) · Nanotechnology · doi:10.1088/0957-4484/20/22/225602 · Cited by 60
Tang, K., Meng, A. C., Hui, F., Shi, Y., Petach, T. A., Hitzman, C. J., Koh, A. L., Goldhaber‐Gordon, D., Lanza, M., & McIntyre, P. C. (2017) · Nano Letters · doi:10.1021/acs.nanolett.7b01460 · Cited by 62
Kwak, J. S., Do, Y. H., Bae, Y. C., Im, H. S., Yoo, J. H., Sung, M. G., Hwang, Y. T., & Hong, J. P. (2010) · Applied Physics Letters · doi:10.1063/1.3442499 · Cited by 57
Modeling for multilevel switching in oxide-based bipolar resistive memory
Hur, J., Kim, K. M., Chang, M., Lee, S. R., Lee, D., Lee, C. B., Lee, M., Kim, Y.-B., Kim, C., & Chung, U. (2012) · Nanotechnology · doi:10.1088/0957-4484/23/22/225702 · Cited by 56
Ultrafast RESET Analysis of HfOx‐Based RRAM by Sub‐Nanosecond Pulses
Wang, C., Wu, H., Gao, B., Wu, W., Dai, L., Li, X., & Qian, H. (2017) · Advanced Electronic Materials · doi:10.1002/aelm.201700263 · Cited by 57
Promising Materials and Synthesis Methods for Resistive Switching Memory Devices: A Status Review
Kamble, G. U., Patil, A. P., Kamat, R. K., Kim, J. H., & Dongale, T. D. (2023) · ACS Applied Electronic Materials · doi:10.1021/acsaelm.3c00062 · Cited by 56
Resistance switching properties of molybdenum oxide films
有田正志, Kaji, H., Fujii, T., & Takahashi, Y. (2011) · Thin Solid Films · doi:10.1016/j.tsf.2011.10.174 · Cited by 54
Shuai, Y., Ou, X., Luo, W., Mücklich, A., Bürger, D., Zhou, S., Wu, C., Chen, Y., Zhang, W., Helm, M., et al. (2013) · Scientific Reports · doi:10.1038/srep02208 · Cited by 54
Gao, B., Chen, B., Zhang, F., Liu, L., Liu, X., Kang, J., Yu, H. Y., & Yu, B. (2013) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2013.2245508 · Cited by 54
“Although multilevel resistive switching behavior has been demonstrated in many metal oxides, such as HfOx, WOx, TaOx, ZnO, and TiOx [2]–[8],”
BackgroundReversible voltage dependent transition of abnormal and normal bipolar resistive switching
Wang, G., Li, C., Chen, Y., Xia, Y., Wu, D., & Xu, Q. (2016) · Scientific Reports · doi:10.1038/srep36953 · Cited by 54
Sun, C., Lu, S., Jin, F., Mo, W., Song, J., & Dong, K. (2018) · Journal of Alloys and Compounds · doi:10.1016/j.jallcom.2018.03.320 · Cited by 52
A Winograd-Based Integrated Photonics Accelerator for Convolutional Neural Networks
Mehrabian, A., Miscuglio, M., Alkabani, Y., Sorger, V. J., & El‐Ghazawi, T. (2019) · IEEE Journal of Selected Topics in Quantum Electronics · doi:10.1109/jstqe.2019.2957443 · Cited by 53
“Having said that, memristive memory devices have attracted the attentionof researchers due to their interesting characteristics including but not limited to non-volatility, long state retention time, and ultra-low power consumption [23], [39], [40].”
BackgroundAnalysis of Transient Currents During Ultrafast Switching of $\hbox{TiO}_{2}$ Nanocrossbar Devices
Hermes, C., Wimmer, M., Menzel, S., Fleck, K., Bruns, G., Salinga, M., Böttger, U., Bruchhaus, R., Schmitz-Kempen, T., Wuttig, M., et al. (2011) · IEEE Electron Device Letters · doi:10.1109/led.2011.2156377 · Cited by 51
“operations underlining the potential for use in future applications [3], [4].”
BackgroundResultLow temperature solution-processed graphene oxide/Pr0.7Ca0.3MnO3 based resistive-memory device
Kim, I., Siddik, M., Shin, J., Biju, K. P., Jung, S., & Hwang, H. (2011) · Applied Physics Letters · doi:10.1063/1.3617426 · Cited by 49
Capacity based nondestructive readout for complementary resistive switches
Tappertzhofen, S., Linn, E., Nielen, L., Rosezin, R., Lentz, F., Bruchhaus, R., Valov, I., Böttger, U., & Waser, R. M. (2011) · Nanotechnology · doi:10.1088/0957-4484/22/39/395203 · Cited by 49
$${ SIM}^2{ RRAM}$$ S I M 2 R R A M : a physical model for RRAM devices simulation
Villena, M. A., Roldán, J. B., Jiménez-Molinos, F., Miranda, E. A., Suñé, J., & Lanza, M. (2017) · Journal of Computational Electronics · doi:10.1007/s10825-017-1074-8 · Cited by 53
Ultrafast resistive switching in SrTiO3:Nb single crystal
Zhang, X., Yu, Q. X., Yao, Y., & Li, X. G. (2010) · Applied Physics Letters · doi:10.1063/1.3524216 · Cited by 48
Bipolar resistive switching in individual Au–NiO–Au segmented nanowires
Herderick, E. D., Reddy, K. M., Sample, R. N., Draskovic, T. I., & Padture, N. P. (2009) · Applied Physics Letters · doi:10.1063/1.3263733 · Cited by 48
Choi, H.-W., Song, K.-W., Kim, S.-H., Nguyen, K. T., Eadi, S. B., Kwon, H.-M., & Lee, H. (2022) · Scientific Reports · doi:10.1038/s41598-022-05150-w · Cited by 48
Enhanced resistance switching stability of transparent ITO/TiO 2 /ITO sandwiches
Meng, Y., Zhang, P., Ziyu, L., Zhao-Liang, L., Pan, X., Liang, X., Hong-Wu, Z., & Dong-Min, C. (2010) · Chinese Physics B · doi:10.1088/1674-1056/19/3/037304 · Cited by 46
Oxygen vacancy filament formation in TiO2: A kinetic Monte Carlo study
Li, D., Li, M., Zahid, F., Wang, J., & Hong, G. (2012) · Journal of Applied Physics · doi:10.1063/1.4757584 · Cited by 47
Rectifying filamentary resistive switching in ion-exfoliated LiNbO3 thin films
Pan, X., Shuai, Y., Wu, C., Luo, W., Sun, X., Zeng, H., Zhou, S., Böttger, R., Ou, X., Mikolajick, T., et al. (2016) · Applied Physics Letters · doi:10.1063/1.4940372 · Cited by 45
Song, J.-M., & Lee, J. (2016) · Scientific Reports · doi:10.1038/srep18967 · Cited by 45
Conduction mechanisms at distinct resistive levels of Pt/TiO2-x/Pt memristors
Michalas, L., Stathopoulos, S., Khiat, A., & Prodromakis, T. (2018) · Applied Physics Letters · doi:10.1063/1.5040936 · Cited by 47
Huang, Y.-T., Yu, S.-Y., Hsin, C., Huang, C., Kang, C., Chu, F.-H., Chen, J.-Y., Hu, J.-C., Chen, L.-T., He, J., et al. (2013) · Analytical Chemistry · doi:10.1021/ac303528m · Cited by 43
Low power multi-level-cell resistive memory design with incomplete data mapping
Niu, D., Zou, Q., Xu, C., & Xie, Y. (2013) · IEEE International Conference on Computer Design: VLSI in Computers and Processors (ICCD) · doi:10.1109/iccd.2013.6657035 · Cited by 43
“Various materials, including TiOx [27], HfOx [19], as well as TaOx [22], have already shown their feasibility as the switching materials of MLC ReRAM.”
BackgroundMemristors With Flexible Electronic Applications
Gergel-Hackett, N., Tedesco, J. L., & Richter, C. A. (2011) · Proceedings of the IEEE · doi:10.1109/jproc.2011.2158284 · Cited by 43
Lin, M.-H., Wu, M.-C., Lin, C.-H., & Tseng, T. (2010) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2010.2050837 · Cited by 42
“ducting filaments by the Joule heating effect [42], [43].”
BackgroundResistive Switching in Organic Memories with a Spin-Coated Metal Oxide Nanoparticle Layer
Verbakel, F., Meskers, S. C. J., de Leeuw, D. M., & Janssen, R. A. J. (2008) · The Journal of Physical Chemistry C · doi:10.1021/jp800624u · Cited by 40
Zhu, X., Li, Q., Ioannou, D. E., Gu, D., Bonevich, J. E., Baumgart, H., Suehle, J. S., & Richter, C. A. (2011) · Nanotechnology · doi:10.1088/0957-4484/22/25/254020 · Cited by 37
Highly Stable Ultrathin TiO2Based Resistive Random Access Memory with Low Operation Voltage
Chen, S.-X., Chang, S.-P., Chang, S., Hsieh, W.-K., & Lin, C.-H. (2018) · ECS Journal of Solid State Science and Technology · doi:10.1149/2.0281807jss · Cited by 37
Review of applications of 2D materials in memristive neuromorphic circuits
Wang, L., Shen, X., Gao, Z., Fu, J., Yao, S., Cheng, L., & Lian, X. (2022) · Journal of Materials Science · doi:10.1007/s10853-022-06954-x · Cited by 35
Reproducible resistance switching for BaTiO3 thin films fabricated by RF-magnetron sputtering
Jung, C. H., Woo, S. I., Kim, Y. S., & No, K. S. (2010) · Thin Solid Films · doi:10.1016/j.tsf.2010.12.149 · Cited by 34
Unipolar resistive switching in CoFeB∕MgO∕CoFeB magnetic tunnel junction
Yoshida, C., Kurasawa, M., Lee, Y. M., Aoki, M., & Sugiyama, Y. (2008) · Applied Physics Letters · doi:10.1063/1.2898514 · Cited by 34
Self-citationEngineering oxide resistive switching materials for memristive device application
Liu, L., Chen, B., Gao, B., Zhang, F., Chen, Y., Liu, X., Wang, Y., Han, R., & Kang, J. (2011) · Applied Physics A · doi:10.1007/s00339-011-6331-2 · Cited by 33
Multifilamentary Conduction Modeling in Transition Metal Oxide-Based RRAM
Asapu, S., & Maiti, T. (2017) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2017.2709249 · Cited by 32
“Many materials, such as Al2O3 [1], TiO2 [2], [3], HfO2 [4], [5], Ta2O5 [6], [7], Nb2O5 [8], and ZnO [9] have been tested for RRAM applications.”
An Electrical Characterisation Methodology for Benchmarking Memristive Device Technologies
Stathopoulos, S., Michalas, L., Khiat, A., Serb, A., & Prodromakis, T. (2019) · Scientific Reports · doi:10.1038/s41598-019-55322-4 · Cited by 31
Resistive switching properties and low resistance state relaxation in Al/Pr0.7Ca0.3MnO3/Pt junctions
Li, S., Liao, Z., Li, J., Gang, J. L., & Zheng, D. N. (2009) · Journal of Physics D Applied Physics · doi:10.1088/0022-3727/42/4/045411 · Cited by 31
Titanium nanotubes grown by titanium anodization
Alivov, Y., Fan, Z., & JOHNSTONE, D. K. (2009) · Journal of Applied Physics · doi:10.1063/1.3187927 · Cited by 31
Nanoionic devices: Interface nanoarchitechtonics for physical property tuning and enhancement
Tsuchiya, T., Terabe, K., Yang, R., & Aono, M. (2016) · Japanese Journal of Applied Physics · doi:10.7567/jjap.55.1102a4 · Cited by 31
Chen, P.-S., Lee, H.-Y., Chen, Y.-S., Chen, F. T., & Tsai, M. (2010) · Japanese Journal of Applied Physics · doi:10.1143/jjap.49.04dd18 · Cited by 30
Al‐Haddad, A., Wang, C., Qi, H., Grote, F., Wen, L., Bernhard, J., Vellacheri, R., Tarish, S., Nabi, G., Kaiser, U. A., et al. (2016) · ACS Applied Materials & Interfaces · doi:10.1021/acsami.6b05424 · Cited by 29
Electronic structure and stability of low symmetry Ta2O5polymorphs
Kim, J. Y., Magyari-Köpe, B., Lee, K.-J., Kim, H., Lee, S., & Nishi, Y. (2014) · physica status solidi (RRL) - Rapid Research Letters · doi:10.1002/pssr.201409018 · Cited by 29
Metadata
- Authors
- Yoshida, C., Tsunoda, K., Noshiro, H., & Sugiyama, Y.
- Affiliations
- Fujitsu (Japan) (JP)
- ORCID
- Yoshida, Chikako
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 2007-11-26
- Volume
- 91
- Issue
- 22
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W2074429207
- Cited by
- 271
- References
- 7
- Citations by year
- 2026: 3 · 2025: 3 · 2024: 4 · 2023: 11 · 2022: 13 · 2021: 6 · 2020: 6 · 2019: 12 · 2018: 21 · 2017: 19 · 2016: 19 · 2015: 5 · 2014: 23 · 2013: 24 · 2012: 21
- FWCI
- 14.50
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Applied Physics Letters (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced Memory and Neural Computing
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Ferroelectric and Negative Capacitance Devices
- Physical Sciences › Materials Science › Materials Chemistry › Phase-change materials and chalcogenides
- Keywords
- resistive switching, non-volatile memory, bipolar resistive switching, multilevel memory, data retention, endurance, high-speed switching, rutile TiO2, metal-insulator-metal devices
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