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Cited by 309

The DOI matches its Crossref record; 5 of the 5 references it cites were found in a registry or an index.

Performance limiting micropipe defects in silicon carbide wafers

Open access
Neudeck, P.G., Powell, J.A.·1994·IEEE Electron Device Letters

Abstract

Reports on the characteristics of a major defect in mass-produced silicon carbide wafers which severely limits the performance of silicon carbide power devices. Micropipe defects originating in 4H- and 6H-SiC substrates were found to cause pre-avalanche reverse-bias point failures in most epitaxially-grown pn junction devices of 1 mm/sup 2/ or larger in area. Until such defects are significantly reduced from their present density (on the order of 100's of micropipes/cm/sup 2/), silicon carbide power device ratings will be restricted to around several amps or less.>

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Metadata

Authors
Neudeck, P. G., & Powell, J. A.
Venue
IEEE Electron Device Letters
Published
1994-02
Volume
15
Issue
2
Pages
63-65
ISSN
  • 0741-3106 (ISSN-L)
  • 1558-0563
OpenAlex
W2121604213
Cited by
309
References
5
FWCI
16.10
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: Performance limiting micropipe defects in silicon carbide wafers. https://app.cochat.ai/papers/10.1109/55.285372
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Neudeck, P. G., & Powell, J. A. (1994). Performance limiting micropipe defects in silicon carbide wafers. IEEE Electron Device Letters. https://doi.org/10.1109/55.285372

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