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Reliability and failure analysis in power GaN-HEMTs: An overview
Abstract
Power GaN transistors have recently demonstrated to be excellent devices for application in power electronics. The high breakdown field and the superior mobility of the 2-dimensional electron gas allow to fabricate transistors with low resistive and switching losses, that permit to increase the efficiency of switching mode power converters beyond 99 %. GaN-based transistors are currently supposed to be adopted in KW-range power converters; 650 V transistors are already available on the market, and 1200 V devices are currently under development. During operation, GaN power transistors can reach critical conditions, especially in the off-state (with a high VDS, in excess of 650 V), during hard-switching (where high current and voltage can be simultaneously present), and for high positive gate voltages (in the case of normally-off devices). This paper reports our most recent results on the gradual and catastrophic degradation of GaN-based power HEMTs. We present the results of three different case studies, on: (i) the time-dependent breakdown of power HEMTs submitted to high off-state stress; (ii) the degradation of HEMTs with p-GaN gate submitted to high gate stress; (iii) the hot electron effects in GaN-MISHEMTs submitted to high-temperature source current stress.
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In e-mode GaN FETs, time-dependent degradation and breakdown due to positive bias exposure can occur even without any dielectric in the gate-stack.
“In the e-mode GaN FET case, there is still time-dependent degradation and breakdown due to positive bias exposure, even without any dielectric in the gate-stack [38].”
From Review and Outlook on GaN and SiC Power Devices: Industrial State-of-the-Art, Applications, and Perspectives (2024) · cites this paper as [38]
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Cited by
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Buffolo, M., Favero, D., Marcuzzi, A., De Santi, C., Meneghesso, G., Zanoni, E., & Meneghini, M. (2024) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2023.3346369 · Cited by 476
Self-citationImpact of Sidewall Etching on the Dynamic Performance of GaN-on-Si E-Mode Transistors
Tajalli, A., Canato, E., Nardo, A., Meneghini, M., Stockman, A., Moens, P., Zanoni, E., & Meneghesso, G. (2019) · 2019 IEEE International Reliability Physics Symposium (IRPS) · doi:10.1109/irps.2019.8720445 · Cited by 5
Self-citation
Metadata
- Authors
- Meneghini, M., Rossetto, I., De Santi, C., Rampazzo, F., Tajalli, A., Barbato, A., Ruzzarin, M., Borga, M., Canato, E., Zanoni, E., & Meneghesso, G.
- Affiliations
- University of Padua (IT)
- ORCID
- Venue
- 2017 IEEE International Reliability Physics Symposium (IRPS)
- Publisher
- IEEE
- Published
- 2017-04
- Pages
- 3B-2.1-3B-2.8
- ISSN
- 0735-0791 (ISSN-L)
- OpenAlex
- W2620750081
- Cited by
- 120
- References
- 0
- Citations by year
- 2026: 8 · 2025: 13 · 2024: 19 · 2023: 13 · 2022: 10 · 2021: 10 · 2020: 16 · 2019: 16 · 2018: 10 · 2017: 5
- FWCI
- 30.78
- Type
- conference paper
- Language
- en
- Open access
- closed
- Locations
- IEEE International Reliability Physics Symposium proceedings (publishedVersion)
- Padua Research Archive (University of Padova) (submittedVersion)
- Topics
- Physical Sciences › Physics and Astronomy › Condensed Matter Physics › GaN-based semiconductor devices and materials
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
- Physical Sciences › Materials Science › Electronic, Optical and Magnetic Materials › Ga2O3 and related materials
- Keywords
- GaN HEMT, device reliability, failure analysis, time-dependent breakdown, off-state stress, gate stress, p-GaN gate, hot electron effects, hard switching, power converters
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