Ekinci, Yasin

Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

Cardineau, B., Del Re, R., Marnell, M., Al-Mashat, H., Vockenhuber, M., Ekinci, Y., Sarma, C., Freedman, D. A., & Brainard, R. L. (2014) · Microelectronic Engineering

Advancements in Photolithography TechniquesOrganometallic Compounds Synthesis and Characterization

Cited by 202

Beyond EUV lithography: a comparative study of efficient photoresists' performance

Mojarad, N., Gobrecht, J., & Ekinci, Y. (2015) · Scientific Reports

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 162

Extreme ultraviolet lithography

Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 149

Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications

Mojarad, N., Gobrecht, J., & Ekinci, Y. (2015) · Microelectronic Engineering

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 114

Absorption coefficient of metal-containing photoresists in the extreme ultraviolet

Fallica, R., Haitjema, J., Wu, L., Castellanos Ortega, S., Brouwer, A. M., & Ekinci, Y. (2018) · Journal of Micro/Nanopatterning Materials and Metrology

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 105

Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond

Mojarad, N., Hojeij, M., Wang, L., Gobrecht, J., & Ekinci, Y. (2015) · Nanoscale

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 102

Improvements in resist performance towards EUV HVM

Yildirim, O., Buitrago, E., Hoefnagels, R., Meeuwissen, M., Wuister, S., Rispens, G., van Oosten, A., Derks, P., Finders, J., Vockenhuber, M., et al. (2017) · SPIE Proceedings

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 69

Extreme ultraviolet lithography reaches 5 nm resolution

Giannopoulos, I., Mochi, I., Vockenhuber, M., Ekinci, Y., & Kazazis, D. (2024) · Nanoscale

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 69

EUV resists based on tin-oxo clusters

Cardineau, B., Del Re, R., Al-Mashat, H., Marnell, M., Vockenhuber, M., Ekinci, Y., Sarma, C., Neisser, M., Freedman, D. A., & Brainard, R. L. (2014) · SPIE Proceedings

Advancements in Photolithography TechniquesOrganometallic Compounds Synthesis and Characterization

Cited by 67

Achromatic spatial frequency multiplication: A method for production of nanometer-scale periodic structures

Solak, H. H., & Ekinci, Y. (2005) · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 54

Mixed-ligand zinc-oxoclusters: Efficient chemistry for high resolution nanolithography

Thakur, N., Bliem, R., Mochi, I., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2020) · Journal of Materials Chemistry C

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 52

Mechanistic insights in Zr-and Hf-based molecular hybrid EUV photoresists

Wu, L., Baljozovic, M., Portale, G., Kazazis, D., Vockenhuber, M., Jung, T., Ekinci, Y., & Castellanos Ortega, S. (2019) · Journal of Micro/Nanopatterning Materials and Metrology

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 49

Photolithography reaches 6 nm half-pitch using extreme ultraviolet light

Fan, D., & Ekinci, Y. (2016) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 35

Resistless EUV lithography: Photon-induced oxide patterning on silicon

Tseng, L.-T., Karadan, P., Kazazis, D., Constantinou, P. C., Stock, T. J. Z., Curson, N. J., Schofield, S. R., Muntwiler, M., Aeppli, G., & Ekinci, Y. (2023) · Science Advances

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 34

EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning

Constantinou, P., Stock, T. J. Z., Tseng, L.-T., Kazazis, D., Muntwiler, M., Vaz, C. A. F., Ekinci, Y., Aeppli, G., Curson, N. J., & Schofield, S. R. (2024) · Nature Communications

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 27

High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers

Wang, X., Kazazis, D., Tseng, L.-T., Robinson, A. P. G., & Ekinci, Y. (2022) · Nanotechnology

Advancements in Photolithography TechniquesOptical Coatings and Gratings

Cited by 15

Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers

Lugier, O., Thakur, N., Wu, L., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2021) · ACS Applied Materials & Interfaces

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 13

Advancements in EUV photoresists for high-NA lithography

Develioglu, A., Vockenhuber, M., van Lent-Protasova, L., Mochi, I., Ekinci, Y., & Kazazis, D. (2023) · International Conference on Extreme Ultraviolet Lithography 2023

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 12