Cited by 17Silicon Carbide Semiconductor TechnologiesGaN-based semiconductor devices and materialsRadiation Effects in Electronics

SiC MOSFETs robustness for diode-less applications

Open access
Avino-Salvado, O., Cheng, C., Buttay, C., Morel, H., Labrousse, D., Lefebvre, S., Ali, M.·2018·EPE Journal

Abstract

Silicon-Carbide (SiC) technology presents several advantages over silicon for power electronics applications, such as lower losses. However, SiC technology is not totally mature, and some reliability problems remain. This paper studies the robustness of SiC MOSFETs in the case of diode-less applications and the associated phenomena, such as gate oxide degradation. Several devices were stressed under conditions of inductive switching and inverse current conduction. These devices were periodically characterized. As a result, a threshold voltage shift was observed in the MOSFET, with a dependence on the duty cycle of the transistor. On the contrary, no significant degradation of the internal P-N junction of the transistor was observed.

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Crossref · 10.1080/09398368.2018.1456836

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  • The CMB test accelerates internal PiN diode degradation by body diode conduction.

    “The chopper mode bias (CMB) test accelerates the internal PiN diode degradation by body diode conduction [62], [63].”

    From AC Power Cycling Test Setup and Condition Monitoring Tools for SiC-Based Traction Inverters (2023) · cites this paper as [62]

    Section 3.3 describes CMB testing that forces current through the intrinsic diode to assess possible P–N junction degradation. But section 4.2 reports that the diode’s forward voltage remained constant, suggesting no noticeable P–N junction degradation; the observed degradation was in threshold voltage instead. (LLM, conf=0.89)

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Research works printed but not linked: 2

  1. P. Friedrichs, "Sic power devices-lessons learned and prospects after 10 years of commer- cial availability," in The International Conference on Compound Semiconductor Manu- facturing Technology, 2011.
  2. K. Hara, H. Tsuchida, M. Ito, H. Fujibayashi, M. Naitou, T. Kozawa, H. Uehigashi, K. Fukada, H. Osawa, and I. Kamata, "Analysis and reduction of stacking faults in fast epitaxial growth," in Silicon Carbide and Related Materials 2015, vol. 858 of Materials Science Forum, pp. 173-176, Trans Tech Publications, 6 2016.

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Authors
Avino-Salvado, O., Cheng, C., Buttay, C., Morel, H., Labrousse, D., Lefebvre, S., & Ali, M.
Affiliations
  • Univ Lyon, INSA-Lyon, CNRS, Laboratoire Ampère UMR 5005, Villeurbanne, France.
  • Centre National de la Recherche Scientifique (FR)
Corresponding author
Morel, H.
Venue
EPE Journal
Published
2018-04-02
Volume
28
Issue
3
Pages
128-135
ISSN
  • 0939-8368 (ISSN-L)
  • 2376-9319
OpenAlex
W2795449139
Cited by
17
References
26
Citations by year
2025: 2 · 2024: 3 · 2023: 3 · 2022: 1 · 2021: 2 · 2020: 1 · 2019: 2 · 2018: 3
FWCI
0.77
Type
journal article
Language
en
Open access
Licence
other-oa
Locations
  • EPE Journal (publishedVersion)
  • HAL (submittedVersion, other-oa)
Topics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
  • Physical Sciences › Physics and Astronomy › Condensed Matter Physics › GaN-based semiconductor devices and materials
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Radiation Effects in Electronics
Keywords
SiC MOSFET, silicon carbide power devices, gate oxide degradation, threshold voltage shift, inductive switching, device reliability

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