Thermal conductivity of a -Si:H thin films
Abstract
The thermal conductivity of sputtered a-Si:H thin films for a hydrogen content of 1--20 % and a film thickness of 0.2--1.5 \ensuremath{\mu}m is determined in the temperature range 80--400 K using an extension of the 3\ensuremath{\omega} measurement technique. The reliability of the method is demonstrated on 1-\ensuremath{\mu}m-thick a-${\mathrm{SiO}}_{2}$ thermally grown on Si. Scattering of phonons at the interface between the a-Si:H film and the substrate places a simple upper limit on the heat transport by long-wavelength phonons and facilitates the comparison of the experimental data to recent numerical solutions of a Kubo formula using harmonic vibrations.
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Propagating phononlike modes in a-Si were first inferred by a disagreement between thermal conductivity measurements and modelling predictions that was resolved by the consideration of low-frequency Debye modes.
“Propagating phononlike modes in a-Si were first inferred by a disagreement between thermal conductivity measurements and modelling predictions that was resolved by the consideration of low-frequency Debye modes 35 .”
From Broadband phonon mean free path contributions to thermal conductivity measured using frequency domain thermoreflectance (2013) · cites this paper as [35]
Cites
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Self-citationThermal resistance at interfaces
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Measurement of thermal conductivity of silicon dioxide thin films using a 3ω method
Yamane, T., Nagai, N., Katayama, S.-I., & Todoki, M. (2002) · Journal of Applied Physics · doi:10.1063/1.1481958 · Cited by 367 · see citing works
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- Authors
- Cahill, D. G., Katiyar, M., & Abelson, J. R.
- Affiliations
- University of Illinois Urbana-Champaign (US)
- Venue
- Physical Review B
- Publisher
- American Physical Society (APS)
- Published
- 1994-09-01
- Volume
- 50
- Issue
- 9
- Pages
- 6077-6081
- ISSN
- 0163-1829 (ISSN-L)
- 1095-3795
- OpenAlex
- W2007654816
- Cited by
- 523
- References
- 2
- Citations by year
- 2026: 9 · 2025: 13 · 2024: 12 · 2023: 12 · 2022: 13 · 2021: 32 · 2020: 17 · 2019: 26 · 2018: 27 · 2017: 24 · 2016: 36 · 2015: 26 · 2014: 23 · 2013: 27 · 2012: 25
- FWCI
- 4.69
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Physical review. B, Condensed matter (publishedVersion)
- PubMed (publishedVersion)
- Topics
- Physical Sciences › Materials Science › Materials Chemistry › Thermal properties of materials
- Physical Sciences › Engineering › Mechanics of Materials › Thermography and Photoacoustic Techniques
- Physical Sciences › Engineering › Mechanics of Materials › Metal and Thin Film Mechanics
- Keywords
- thermal conductivity, hydrogenated amorphous silicon, a-Si:H thin films, sputtered thin films, hydrogen content, film thickness, low-temperature thermal transport, phonon scattering at interfaces, long-wavelength phonons, Kubo formula, harmonic oscillations
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