Cited by 126Silicon Carbide Semiconductor TechnologiesRadiation Effects in ElectronicsSemiconductor materials and devices

A New Complete Condition Monitoring Method for SiC Power MOSFETs

Ugur, Enes, Xu, Chi, Yang, Fei, Pu, Shi, Akin, Bilal·2021·IEEE Transactions on Industrial Electronics

Abstract

This article proposes a new complete condition monitoring method which can independently monitor both the threshold voltage drift and the packaging degradation accurately by monitoring only the reverse body diode voltage drop at different gate bias levels. The SiC MOSFETs are aged through an accelerated aging method and the corresponding changes in electrical parameters are periodically measured to assess their correlation with the state of the device's health. It has been revealed that the on-state resistance reveals the combination of gate oxide and package-related degradation while the threshold voltage mainly depicts gate oxide-related issues. Unlike these two parameters, the body diode voltage drop is found to independently indicate the state of device health both for package and gate oxide. This is caused by a unique secondary conduction mode of SiC MOSFETs in third-quadrant operation which is clearly disclosed with transition boundaries by a proposed body diode transfer characterization curve. In order to have a detailed condition information of the device with a simple circuit, monitoring the reverse body diode voltage drop at 0 and -5 V gate bias is proposed. The proposed condition monitoring method is implemented on a gate drive circuit and experimental results are given for two artificially degraded devices. The experimental results confirm that the proposed method can independently monitor both the gate oxide and packaging degradations accurately by monitoring a single precursor parameter. The proposed method can be integrated into the gate driver or converter itself to monitor SiC devices.

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Crossref · 10.1109/tie.2020.2970668

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Authors
Ugur, E., Xu, C., Yang, F., Pu, S., & Akin, B.
Affiliations
The University of Texas at Dallas (US)
Venue
IEEE Transactions on Industrial Electronics
Published
2021-02
Volume
68
Issue
2
Pages
1654-1664
ISSN
  • 0278-0046 (ISSN-L)
  • 1557-9948
OpenAlex
W3004758912
Cited by
126
References
34
Citations by year
2026: 17 · 2025: 27 · 2024: 36 · 2023: 18 · 2022: 11 · 2021: 13 · 2020: 4
FWCI
3.95
Type
journal article
Language
en
Open access
closed
Locations
IEEE Transactions on Industrial Electronics (publishedVersion)
Funders
  • National Science Foundation (1454311)
  • Semiconductor Research Corporation (2712.026)
Topics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Radiation Effects in Electronics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Semiconductor materials and devices
Keywords
SiC power MOSFETs, condition monitoring, threshold voltage shift, gate oxide degradation, accelerated aging, on-resistance, gate bias, gate driver

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