The DOI matches its Crossref record; 120 of the 121 references it cites were found in a registry or an index; none of the 79 sources its claims cite is checked for support yet.
Parallel Connection of Silicon Carbide MOSFETs—Challenges, Mechanism, and Solutions
Open accessAbstract
Power semiconductor devices are often connected in parallel to increase the current rating of the power conversion systems. However, due to mismatched circuit parameters or semiconductor fabrication discrepancies, the current of paralleled power semiconductor devices can be unbalanced, which potentially leads to accelerated aging and long-term reliability issues. The fast-switching speed of silicon carbide (SiC) devices aggravates this problem due to its higher sensitivity to parasitic parameters. Numerous efforts have been dedicated to analyzing and addressing the current imbalance issue of paralleling SiC devices. This article comprehensively summarizes and presents state-of-the-art research regarding the current imbalance in paralleled SiC devices. Degree of imbalance is proposed to comprehensively quantify the current mismatch. Starting with mechanism analysis, different types of current imbalance are categorized. Various device parameters and the package layout that impact the current distribution are investigated. The existing solutions including passive methods and active methods are concluded and categorized. This work also incorporates insight into the future development needs of high-power multichip SiC module packaging and driving technologies.
Overview
CoChat Summary
TL;DR
This review synthesizes the mechanisms and mitigation of current imbalance in paralleled SiC MOSFETs, proposing static and dynamic Degree of Imbalance (DoI) metrics. It categorizes causes into device parameters, circuit parasitics, and status indicators, and reviews passive and active current-sharing solutions.
Key findings
- Paralleling SiC MOSFETs is more challenging than paralleling Si IGBTs due to smaller dies, larger parameter spread, and faster switching. On a 6-inch wafer, yield falls from 97.54% for 5 × 5 mm dies to 90.56% for 10 × 10 mm dies; for ≤750 V, a single SiC die is about 100 A at 5 × 5 mm² versus about 300 A at 10 × 12 mm² for Si IGBT.
- Static imbalance is mainly from \(R_{dson}\) mismatch, while dynamic imbalance arises from \(V_{th}\), \(L_s\), gate delay, and related factors. \(R_{dson}\)’s positive temperature coefficient self-balances static current, but \(V_{th}\)’s negative temperature coefficient can self-aggravate and risk thermal runaway. For 650 V SiC, \(R_{CH}\) can exceed 50% of total \(R_{dson}\); for 1.7 kV, it can be below 30%.
- \(L_s\) mismatch strongly affects dynamic current sharing; \(L_d\) has little dynamic impact but affects ringing and can affect static sharing if current changes; \(L_g\) mismatch is minor. An auxiliary source connection reduced peak current difference from 18 A to 9 A in a four-die module.
- Solutions are passive (die preselection/screening, symmetric layout) and active (external passive components, active gate drivers). Design rules are to reduce mismatched \(L_s\) and the \(di/dt\) applied across it. AGD is challenging because SiC transients can be within 100 ns, with \(di/dt\) up to 5 A/ns and \(dV/dt\) over 50 V/ns.
Methods
- Review/synthesis of state-of-the-art research on paralleling SiC MOSFETs; proposes static and dynamic DoI indices and categorizes pertinent parameters into device, circuit, and status types.
- Draws on cited experimental and simulation evidence, including curve-tracer testing of 20 SiC MOSFETs for \(V_{th}\), LTspice simulation for \(L_g\), PFC converter simulation for \(T_j\), and module current-sharing experiments.
Limitations
- The paper does not state limitations of the review itself.
- Evident from the text: as a review, it synthesizes prior work rather than providing a systematic meta-analysis or unified experimental validation across all methods.
- The paper notes technology limitations: AGD is premature for SiC due to very short switching transients (often within 100 ns; \(di/dt\) up to 5 A/ns), external passive components add cost and parasitics, and high-temperature known-good-die (KGD) for mass production remains challenging.
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Figures





![Fig. 6 Turn-ON process of the two special cases of parallel-connected MOSFETS. (a) Asynchronous gate signal and same switching slew rate. (b) Synchronous gate signal and different slew rate [47].](/paper-figures/8691b20d4e544ef6b40bb5dda2f69e07/parallel-connection-of-silicon-carbide-mosfetschallenges-mechanism-and-solutions-figure-6.png)
![Fig. 7 Turn-OFF process of the two parallel-connected MOSFETs [47].](/paper-figures/0349af3cd8d14117bbc478b19788eeec/parallel-connection-of-silicon-carbide-mosfetschallenges-mechanism-and-solutions-figure-7.png)

![Fig. 9 Thermal network of a bottom-side cooling power device [1].](/paper-figures/62f8d52bb57d4015965f009343971c89/parallel-connection-of-silicon-carbide-mosfetschallenges-mechanism-and-solutions-figure-9.png)






















![Fig. 32 Circuit topology of the adjustable V gs gate driver [99].](/paper-figures/085e5d44f39a45d8940110dd5c2cc561/parallel-connection-of-silicon-carbide-mosfetschallenges-mechanism-and-solutions-figure-32.png)







Verification
Claims the paper makes
65 Own interpretation · 59 Sources not found · 14 No basis given · 13 Own result
A result the paper states — it cites no source for it, so there is none to check. The quote shows it is in the paper.
In the paper
“L g mismatch has a small impact on transient current sharing.”
- Also stated in: § B. Device Parameters Variations 1) R dson Variation: · boosted
“It validates that the impact of L g mismatch on the current distribution is not critical.”
§ Parallel Connection of Silicon Carbide MOSFETs -Challenges, Mechanism, and Solutions > B. Device Parameters Variations 1) R dson Variation:
boosted- Asserted: passes — The authors put it forward as true.
- Checkable: passes — It can be checked against evidence.
- Load-bearing: unclear — It is unclear whether the paper’s conclusions depend on it.
- Based: passes — The paper gives a reason why it holds.
- Also stated in: § B. Device Parameters Variations 1) R dson Variation: · boosted
In the paper
“Fig. 3 is the waveform of the same circuit under different switching speeds [34] which shows that the ringing increases while the di/dt increases from 2 to 6 A/ns.”
§ Parallel Connection of Silicon Carbide MOSFETs -Challenges, Mechanism, and Solutions > C. Challenges Due to Fast Switching Speed
What the sources say
- Not matchedcites [34]
Couldn’t be matched to a paper in Crossref, so it can’t be checked.
plainstates a cause- Asserted: passes — The authors put it forward as true.
- Checkable: passes — It can be checked against evidence.
- Load-bearing: passes — The paper’s conclusions depend on it.
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- Not matched
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In the paper
“In this layout, the effective value of L sxL and L dxL is around 1-2 nH considering the magnetic coupling effects.”
§ Parallel Connection of Silicon Carbide MOSFETs -Challenges, Mechanism, and Solutions > V. ANALYSIS AND MODELING OF MULTICHIP POWER MODULE LAYOUTS
plain- Asserted: passes — The authors put it forward as true.
- Checkable: passes — It can be checked against evidence.
- Load-bearing: unclear — It is unclear whether the paper’s conclusions depend on it.
- Based: passes — The paper gives a reason why it holds.
The paper states this without a source or data behind it here, so there is nothing to check it against. The quote shows it is in the paper.
In the paper
“Even though the value of L s4L and L s2L are identical, the di/dt applied on L s2L is more than 3 times that on L s4L .”
§ Parallel Connection of Silicon Carbide MOSFETs -Challenges, Mechanism, and Solutions > A. Current Coupling Effect
plainstates a cause- Asserted: passes — The authors put it forward as true.
- Checkable: passes — It can be checked against evidence.
- Load-bearing: passes — The paper’s conclusions depend on it.
- Based: unclear — It is unclear why the paper says it holds.
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In the paper
“With a di/dt of 2 kA/μs, the voltage on the parasitic inductance could be around 2-4 V.”
§ Parallel Connection of Silicon Carbide MOSFETs -Challenges, Mechanism, and Solutions > V. ANALYSIS AND MODELING OF MULTICHIP POWER MODULE LAYOUTS
hedgedstates a possible cause- Asserted: passes — The authors put it forward as true.
- Checkable: passes — It can be checked against evidence.
- Load-bearing: passes — The paper’s conclusions depend on it.
- Based: passes — The paper gives a reason why it holds.
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Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
Each contradiction between two passages listed here was confirmed by an independent check.
Rated minor: it would not touch a result — a value no result rests on, a p-value that stays on the same side of the significance level, or a conflict that is clerical, resolved elsewhere in the paper, or outside its own findings.
In the paper
§ Parallel Connection of Silicon Carbide MOSFETs -Challenges, Mechanism, and Solutions > B. Dynamic Degree of Imbalance
“the gate signal of M1 lags behind M2 for ϕ.”
§ Parallel Connection of Silicon Carbide MOSFETs -Challenges, Mechanism, and Solutions > B. Dynamic Degree of Imbalance
“Since the turn-ON signal of M1 is earlier than M2, the peak current of M1, i.e., I d1 _ t3 , is different from that of M2 I d2 _ t3 .It is apparent that M1 undergoes a higher current than M2.”
Rated minor: it would not touch a result — a value no result rests on, a p-value that stays on the same side of the significance level, or a conflict that is clerical, resolved elsewhere in the paper, or outside its own findings.
In the paper
§ Parallel Connection of Silicon Carbide MOSFETs -Challenges, Mechanism, and Solutions > B. Dynamic Degree of Imbalance
“If the overshoot current is neglected, I d1 _ t3 +I d2 _ t3 = 2I o .”
§ Parallel Connection of Silicon Carbide MOSFETs -Challenges, Mechanism, and Solutions > A. Static Degree of Imbalance
“In (1), n is the total number of MOSFETS in parallel and I o is the total load current.Herein, I o = I d1 +I d2 + …I dn .”
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Self-citation
Research works printed but not linked: 5
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Metadata
- Authors
- Li, H., Zhao, S., Wang, X., Ding, L., & Mantooth, H. A.
- Affiliations
- Hefei University of Technology (CN)
- KTH Royal Institute of Technology (SE)
- University of Arkansas at Fayetteville (US)
- Venue
- IEEE Transactions on Power Electronics
- Published
- 2023-08
- Volume
- 38
- Issue
- 8
- Pages
- 9731-9749
- ISSN
- 0885-8993 (ISSN-L)
- 1941-0107
- OpenAlex
- W4377291033
- Cited by
- 135
- References
- 121
- Citations by year
- 2026: 35 · 2025: 65 · 2024: 28 · 2023: 7
- FWCI
- 9.51
- Type
- journal article
- Language
- en
- Open access
- hybrid
- doi.org
- Locations
- IEEE Transactions on Power Electronics (publishedVersion, cc-by)
- VBN Forskningsportal (Aalborg Universitet) (publishedVersion, cc-by)
- Funders
- Anhui Natural Science Foundation (2208085QE164)
- Higher Education Discipline Innovation Project (BP0719039)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced DC-DC Converters
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Multilevel Inverters and Converters
- Keywords
- SiC MOSFET, parallel connection, current imbalance, current sharing, parasitic parameters, power semiconductor reliability, high-speed switching
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