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Soft x-ray reduction lithography using multilayer mirrors
Abstract
A soft x-ray lithograpy using multilayer mirrors for demagnifying optics and a reflecting mask has been designed and studied experimentally. In this system, a wavelength of 45–130 Å has been selected based on the optical characteristics, the exposed depth of the resist film, and the reflectivity of the multilayer mirror. To obtain a replication pattern resolution of 0.2 μm, the numerical aperture required is estimated to be greater than 0.0125 or 0.0325 for a wavelength of 50 or 130 Å, respectively. These values show that the multilayer optics using two mirrors can be realized to replicate a 0.2 μm pattern. The experiments were performed on the SR beamline BL-1 of the KEK-PF storage ring. The Schwarzschild demagnifying optics with a ring field were designed and fabricated. Demagnified exposure patterns of less than 0.5 μm have been obtained using a reflecting mask. The feasibility of the soft x-ray reduction method using multilayer mirrors has been confirmed. Furthermore, new telecentric optics are proposed to realize a practical reduction lithography system.
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Self-citation
Metadata
- Authors
- Kinoshita, H., Kurihara, K., Ishii, Y., & Torii, Y.
- Affiliations
- NTT (Japan) (JP)
- ORCID
- Kurihara, K.
- Venue
- Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
- Publisher
- American Vacuum Society
- Published
- 1989-11-01
- Volume
- 7
- Issue
- 6
- Pages
- 1648-1651
- ISSN
- 0734-211X (ISSN-L)
- 2327-9877
- OpenAlex
- W1999734163
- Cited by
- 270
- References
- 0
- Citations by year
- 2026: 1 · 2025: 5 · 2024: 9 · 2023: 5 · 2022: 1 · 2021: 2 · 2020: 2 · 2019: 6 · 2018: 5 · 2017: 12 · 2016: 13 · 2015: 15 · 2014: 14 · 2013: 10 · 2012: 4
- FWCI
- 10.39
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Physics and Astronomy › Radiation › Advanced X-ray Imaging Techniques
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Particle Accelerators and Free-Electron Lasers
- Keywords
- soft X-ray lithography, multilayer mirrors, telecentric optics, numerical aperture, pattern resolution, synchrotron radiation
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