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Highly Uniform, Electroforming‐Free, and Self‐Rectifying Resistive Memory in the Pt/Ta2O5/HfO2‐x/TiN Structure
Abstract
The development of a resistance switching (RS) memory cell that contains rectification functionality in itself, highly reproducible RS performance, and electroforming‐free characteristics is an impending task for the development of resistance switching random access memory. In this work, a two‐layered dielectric structure consisting of HfO 2 and Ta 2 O 5 layers, which are in contact with the TiN and Pt electrode, is presented for achieving these tasks simultaneously in one sample configuration. The HfO 2 layer works as the resistance switching layer by trapping or detrapping of electronic carriers, whereas the Ta 2 O 5 layer remains intact during the whole switching cycle, which provides the rectification. With the optimized structure and operation conditions for the given materials, excellent RS uniformity, electroforming‐free, and self‐rectifying functionality could be simultaneously achieved from the Pt/Ta 2 O 5/HfO 2/TiN structure.
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In the citing paper
“It has a low current analog operation capability and electroforming-free characteristics, allowing high reliability and uniformity.”
From Flexible self-rectifying synapse array for energy-efficient edge multiplication in electrocardiogram diagnosis (2025) · cites this paper as [24]
In the citing paper
“the self-rectifying characteristics of the device enable large-array operation without complex transistor or selector processes”
From Flexible self-rectifying synapse array for energy-efficient edge multiplication in electrocardiogram diagnosis (2025) · cites this paper as [24]
In the citing paper
“the device is highly compatible with the conventional CMOS process.”
From Flexible self-rectifying synapse array for energy-efficient edge multiplication in electrocardiogram diagnosis (2025) · cites this paper as [24]
In the citing paper
“A charge trap memristor (CTM) is an attractive candidate for the memristor cell of the MCA, because the embodied rectifying characteristic frees it from the sneak current issue.”
From Retention Secured Nonlinear and Self-Rectifying Analog Charge Trap Memristor for Energy-Efficient Neuromorphic Hardware (2023) · cites this paper as [4]
In the citing paper
“In this regard, charge trap memristors (CTM) are promising memristive systems due to their inherent forming‐free and self‐rectifying characteristics.[ 3 , 4 , 5 , 6 , 7 , 8 , 9 , 10 , 11 ]”
From Retention Secured Nonlinear and Self-Rectifying Analog Charge Trap Memristor for Energy-Efficient Neuromorphic Hardware (2023) · cites this paper as [4]
Citations
Cites
High-κ gate dielectrics: Current status and materials properties considerations
Wilk, G. D., Wallace, R. M., & Anthony, J. M. (2001) · Journal of Applied Physics · doi:10.1063/1.1361065 · Cited by 5,905
Lee, M.-J., Lee, C. B., Lee, D., Lee, S. R., Chang, M., Hur, J. H., Kim, Y.-B., Kim, C.-J., Seo, D. H., Seo, S., et al. (2011) · Nature Materials · doi:10.1038/nmat3070 · Cited by 2,228
Self-citationAtomic structure of conducting nanofilaments in TiO2 resistive switching memory
Kwon, D.-H., Kim, K. M., Jang, J. H., Jeon, J. M., Lee, M. H., Kim, G. H., Li, X.-S., Park, G.-S., Lee, B., Han, S., et al. (2010) · Nature Nanotechnology · doi:10.1038/nnano.2009.456 · Cited by 2,092
Self-citation‘Memristive’ switches enable ‘stateful’ logic operations via material implication
Borghetti, J., Snider, G. S., Kuekes, P. J., Yang, J. J., Stewart, D. R., & Williams, R. S. (2010) · Nature · doi:10.1038/nature08940 · Cited by 1,929
Complementary resistive switches for passive nanocrossbar memories
Linn, E., Rosezin, R., Kügeler, C., & Waser, R. M. (2010) · Nature Materials · doi:10.1038/nmat2748 · Cited by 1,286
Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition
Choi, B. J., Jeong, D. S., Kim, S. K., Rohde, C., Choi, S. M., Oh, J. H., Kim, H. J., Hwang, C. S., Szot, K., Waser, R. M., et al. (2005) · Journal of Applied Physics · doi:10.1063/1.2001146 · Cited by 1,149
Self-citationKim, K. M., Jeong, D. S., & Hwang, C. S. (2011) · Nanotechnology · doi:10.1088/0957-4484/22/25/254002 · Cited by 643
Self-citationHigh-Density Crossbar Arrays Based on a Si Memristive System
Jo, S. H., Kim, K.-H., & Lu, W. (2009) · Nano Letters · doi:10.1021/nl8037689 · Cited by 574
Negative oxygen vacancies in HfO2 as charge traps in high-k stacks
Gavartin, J. L., Ramo, D. M., Shluger, A. L., Bersuker, G. I., & Lee, B. H. (2006) · Applied Physics Letters · doi:10.1063/1.2236466 · Cited by 354
Son, M., Lee, J., Park, J., Shin, J., Choi, G., Jung, S., Lee, W., Kim, S., Park, S., & Hwang, H. (2011) · IEEE Electron Device Letters · doi:10.1109/led.2011.2163697 · Cited by 304
Research works printed but not linked: 3
- Seok J. Y., Adv. Funct. Mater.
- Govoreanu B., 2011, IEDM Tech. Dig., 729
- Vincent Crist B., 2000, Handbook of Monochromatic XPS Spectra
Cited by
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Items 101–200 of 277
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Kim, G. S., Park, T. H., Kim, H. J., Ha, T. J., Park, W. Y., Kim, S. G., & Hwang, C. S. (2018) · Journal of Applied Physics · doi:10.1063/1.5033967 · Cited by 28
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Wu, C., Li, X., Xu, X., Lee, B. W., Chae, S. C., & Liu, C. (2020) · Nanotechnology · doi:10.1088/1361-6528/abc782 · Cited by 27
Hu, M., Yu, J., Chen, Y., Wang, S., Dong, B., Wang, H., He, Y., Ma, Y., Zhuge, F., & Zhai, T. (2022) · Materials Horizons · doi:10.1039/d2mh00466f · Cited by 28
Kim, H., Yang, S. J., Shim, Y., & Moon, C. W. (2025) · ACS Applied Materials & Interfaces · doi:10.1021/acsami.5c09862 · Cited by 26
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Sakellaropoulos, D., Bousoulas, P., Nikas, G., Arvanitis, C., Bagakis, E., & Tsoukalas, D. (2020) · Microelectronic Engineering · doi:10.1016/j.mee.2020.111358 · Cited by 26
Liao, C., Hu, X., Liu, X., Sun, B. T., & Zhou, G. (2022) · Applied Physics Letters · doi:10.1063/5.0102076 · Cited by 26
Li, X. Y., Shao, X. L., Wang, Y. C., Jiang, H., Hwang, C. S., & Zhao, J. (2017) · Nanoscale · doi:10.1039/c6nr08470b · Cited by 25
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Abbas, H., Park, M. R., Abbas, Y., Hu, Q., Kang, T. S., Yoon, T., & Kang, C. J. (2018) · Japanese Journal of Applied Physics · doi:10.7567/jjap.57.06hc03 · Cited by 25
Song, S. J., Park, T., Yoon, K. J., Yoon, J. H., Kwon, D. E., Noh, W., Lansalot‐Matras, C., Gatineau, S., Lee, H.-K., Gautam, S., et al. (2016) · ACS Applied Materials & Interfaces · doi:10.1021/acsami.6b11613 · Cited by 24
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Huang, C.-H., Weng, C.-Y., Chen, K., Chou, Y., Wu, T., & Chou, Y. (2023) · ACS Applied Materials & Interfaces · doi:10.1021/acsami.3c03002 · Cited by 24
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Self-citationYe, C., Deng, T.-F., Wu, J., Zhan, C., Wang, H., & Zhang, J. (2015) · Japanese Journal of Applied Physics · doi:10.7567/jjap.54.054201 · Cited by 22
Lai, J. C., Wang, X., Mi, W., Ding, Y., & Yang, B. (2015) · Physica B Condensed Matter · doi:10.1016/j.physb.2015.09.001 · Cited by 22
Giri, A., Kumar, M., Kim, J., Pal, M., Banerjee, W., Nikam, R. D., Kwak, J., Kong, M., Kim, S. H., Thiyagarajan, K., et al. (2021) · Advanced Materials · doi:10.1002/adma.202102252 · Cited by 21
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Park, S., Klett, S., Ivanov, T., Knauer, A., Döll, J., & Ziegler, M. (2021) · Frontiers in Nanotechnology · doi:10.3389/fnano.2021.670762 · Cited by 20
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Song, H., Kim, Y. S., Park, J., & Kim, K. M. (2019) · Advanced Electronic Materials · doi:10.1002/aelm.201800740 · Cited by 18
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Samanta, S., Gong, X., Zhang, P., Han, K., & Fong, X. (2019) · Journal of Alloys and Compounds · doi:10.1016/j.jallcom.2019.07.050 · Cited by 19
Park, T. W., Moon, J., Shin, D. H., Kim, H. J., Kim, S. S., Cho, J. M., Park, H., Woo, K. S., Kim, D. Y., Cheong, S., et al. (2024) · ACS Applied Materials & Interfaces · doi:10.1021/acsami.4c15598 · Cited by 18
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Prakash, C., & Dixit, A. (2023) · Journal of Applied Physics · doi:10.1063/5.0155463 · Cited by 17
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Self-citationCho, J. M., Kim, S., Park, T. W., Shin, D. H., Kim, Y. R., Park, H., Kim, D. Y., Lee, S. H., Park, T., & Hwang, C. S. (2024) · Nanoscale Horizons · doi:10.1039/d4nh00420e · Cited by 17
Self-citationJo, Y., Jung, K., Kim, J., Woo, H., Han, J., Kim, H., Hong, J. P., Lee, J.-K., & Im, H. (2014) · Scientific Reports · doi:10.1038/srep07354 · Cited by 16
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Sun, Z., Wei, L., Feng, C., Miao, P., Guo, M., Yang, H., Li, J., & Zhao, Y. (2016) · Advanced Electronic Materials · doi:10.1002/aelm.201600361 · Cited by 16
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Pal, P., Mazumder, S., Huang, C.-W., Lu, D. D., & Wang, Y. (2022) · ACS Applied Electronic Materials · doi:10.1021/acsaelm.1c01219 · Cited by 15
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Ghazanfar, H., Rabeel, M., Kim, H., Nisar, S., Tahir, M. S., Ahmad, M., Zulfiqar, M. W., Imran, M., Dastgeer, G., & Kim, D. (2025) · Materials Today Physics · doi:10.1016/j.mtphys.2025.101929 · Cited by 15
Kim, S. S., Yong, S. K., Kim, J., Choi, J. M., Park, T. W., Kim, H. Y., Kim, H. J., & Hwang, C. S. (2022) · Advanced Electronic Materials · doi:10.1002/aelm.202200998 · Cited by 14
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Wang, Y., Gong, T., Ding, Y., Li, Y., Wang, W. J., Chen, Z., Du, N., Covi, E., Farronato, M., Ielmini, D., et al. (2022) · Journal of Electronic Science and Technology · doi:10.1016/j.jnlest.2022.100177 · Cited by 14
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Zahari, F., Marquardt, R., Kalläne, M., Gronenberg, O., Schlueter, C., Matveyev, Y., Haberfehlner, G., Diekmann, F., Nierhauve, A., Buck, J., et al. (2023) · Advanced Electronic Materials · doi:10.1002/aelm.202201226 · Cited by 12
Hasina, D., Saini, M. K., Kumar, M., Mandal, A., Basu, N., Maiti, P., Srivastava, S. K., & Som, T. (2023) · Small · doi:10.1002/smll.202305605 · Cited by 12
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Shim, S. K., Jang, Y. H., Han, J., Jeon, J. W., Shin, D. H., Kim, Y. R., Han, J., Woo, K. S., Lee, S. H., Cheong, S., et al. (2024) · Small · doi:10.1002/smll.202306585 · Cited by 11
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Zhang, W., Lei, J., Dai, Y., Zhang, X., Kang, L., Peng, B., & Hu, F. (2022) · Nanotechnology · doi:10.1088/1361-6528/ac5e70 · Cited by 12
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Self-citationKwon, D. E., Kim, J., Kwon, Y. J., Woo, K. S., Yoon, J. H., & Hwang, C. S. (2020) · physica status solidi (RRL) - Rapid Research Letters · doi:10.1002/pssr.202000209 · Cited by 12
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Song, X., Zhang, J., Qian, Y., Xia, Z., Chen, J., Yin, H., Liu, J., Feng, L., Liu, T., Zhu, Z., et al. (2024) · InfoMat · doi:10.1002/inf2.12562 · Cited by 11
Chen, J., Chiu, Y., Chiang, T.-C., & Liu, P. (2025) · Applied Surface Science · doi:10.1016/j.apsusc.2025.163028 · Cited by 11
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Dai, Q., Miao, Y., Qi, X., Zhao, Z., Zhao, F., Zhu, L. Q., & Hu, Z. (2023) · Applied Physics Letters · doi:10.1063/5.0134502 · Cited by 11
Aglieri, V., Lullo, G., Mosca, M., Macaluso, R., Zaffora, A., Franco, F. D., Santamaria, M., Cicero, U. L., & Razzari, L. (2018) · IEEE International Forum on Research and Technology for Society and Industry (RTSI) · doi:10.1109/rtsi.2018.8548396 · Cited by 11
Zhang, J., Yang, T., Wang, J., Zhao, J., & Yan, X. (2020) · Science China Materials · doi:10.1007/s40843-020-1367-x · Cited by 11
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Metadata
- Authors
- Yoon, J. H., Song, S. J., Yoo, I., Seok, J. Y., Yoon, K. J., Kwon, D. E., Park, T. H., & Hwang, C. S.
- Affiliations
- Seoul National University (KR)
- Corresponding author
- Hwang, Cheol Seong
- Venue
- Advanced Functional Materials
- Publisher
- Wiley
- Published
- 2014-05-26
- Volume
- 24
- Issue
- 32
- Pages
- 5086-5095
- ISSN
- 1616-301X (ISSN-L)
- 1616-3028
- OpenAlex
- W2167342413
- Cited by
- 277
- References
- 31
- Citations by year
- 2026: 17 · 2025: 34 · 2024: 30 · 2023: 27 · 2022: 21 · 2021: 26 · 2020: 23 · 2019: 23 · 2018: 21 · 2017: 15 · 2016: 22 · 2015: 17 · 2014: 1
- FWCI
- 9.74
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Advanced Functional Materials (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced Memory and Neural Computing
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Ferroelectric and Negative Capacitance Devices
- Physical Sciences › Materials Science › Materials Chemistry › Phase-change materials and chalcogenides
- Keywords
- resistive random access memory, electroforming-free switching, hafnium oxide, tantalum pentoxide, TiN electrodes, platinum electrode, carrier trapping and detrapping, random access memory
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