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Solvent Vapor Annealing of Block Polymer Thin Films
Abstract
This Perspective provides a critical analysis of the current knowledge concerning solvent vapor annealing (SVA) of block polymer thin films. Herein, we identify key challenges that will be important to overcome for future development of SVA as a practical, reliable, and universal technique for the valorization of block polymer thin films in a wide range of technologies. The Perspective includes a brief background on thin film block polymer self-assembly, a historical account of the SVA technique, an overview of the SVA fundamentals that are necessary to develop a more comprehensive picture of the overall process, and summaries of relevant and important contributions from the recent literature. We also offer our outlook on SVA and suggest important future directions.
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Self-citation
Metadata
- Authors
- Sinturel, C., Vayer, M., Morris, M., & Hillmyer, M. A.
- Venue
- Macromolecules
- Publisher
- American Chemical Society (ACS)
- Published
- 2013-06-28
- Volume
- 46
- Issue
- 14
- Pages
- 5399-5415
- ISSN
- 0024-9297 (ISSN-L)
- 1520-5835
- OpenAlex
- W1998725668
- Cited by
- 543
- References
- 68
- FWCI
- 24.87
- Type
- journal article
- Language
- en
- Open access
- closed
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