Thermoreflectance of metal transducers for time-domain thermoreflectance

Wang, Yuxin; Park, Ji Yong; Koh, Yee Kan; Cahill, David G.

doi:10.1063/1.3457151

Cited by 112Thermography and Photoacoustic TechniquesThermal properties of materialsLaser-Matter Interactions and Applications

Thermoreflectance of metal transducers for time-domain thermoreflectance

Wang, Yuxin, Park, Ji Yong, Koh, Yee Kan, Cahill, David G.·2010·Journal of Applied Physics

DOI 10.1063/1.3457151

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Abstract

We report measurements of the temperature dependence of the optical reflectivity, i.e., the thermoreflectance dR/dT, of 18 metallic elements at two laser wavelengths commonly used in ultrafast pump-probe experiments, 1.55 μm and 785 nm. The thermoreflectance is determined using time-domain thermoreflectance combined with measurements of the laser power and spot size and comparisons between the data and quantitative modeling of the temperature evolution at the surface of the sample. At a laser wavelength of 1.55 μm, four elements within this set of samples, Nb, Re, Ta, and V, have dR/dT comparable to or larger than 0.6×10−4 K−1. At a laser wavelength of 785 nm, the highest thermoreflectance is found in Al and Ta, dR/dT≈2.1×10−4 K−1 and 2.2×10−4 K−1, respectively. Alloying Au with 5% Pd increases the optical absorption by a factor of 3 and the thermoreflectance by a factor of 2.

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For a Ti:sapphire oscillator centered around 800 nm, an Al thin layer with thickness about 100 nm is a common choice as the transducer layer due to its strong absorption (99% absorption depth <60 nm) and exceptionally large thermoreflectance coefficient dR/dT ~10−4 K−1 at 800 nm.
“For a Ti:sapphire oscillator centered around 800 nm, an Al thin layer with a thickness of ~100 nm is a common choice as the transducer layer due to its strong absorption (the 99% absorption depth is <60 nm) 104 and an exceptionally large thermoreflectance coefficient d R /d T ~ 10 -4 K -1 at the 800-nm wavelength. 98, 105, 106”
From Tutorial: Time-domain thermoreflectance (TDTR) for thermal property characterization of bulk and thin film materials (2018) · cites this paper as [105]

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Authors: Wang, Y., Park, J. Y., Koh, Y. K., & Cahill, D. G.
Affiliations: University of Illinois Urbana-Champaign (US)
ORCID: Wang, Yuxin
Park, Ji Yong
Koh, Yee Kan
Cahill, David G.
Venue: Journal of Applied Physics
Publisher: AIP Publishing
Published: 2010-08-15
Volume: 108
Issue: 4
ISSN: 0021-8979 (ISSN-L)
1089-7550
DOI: 10.1063/1.3457151
OpenAlex: W2094737921
Cited by: 112
References: 31
Citations by year: 2026: 4 · 2025: 12 · 2024: 9 · 2023: 6 · 2022: 9 · 2021: 10 · 2020: 6 · 2019: 7 · 2018: 7 · 2017: 10 · 2016: 8 · 2015: 5 · 2014: 7 · 2013: 6 · 2012: 4
FWCI: 6.10
Type: journal article
Language: en
Open access: closed
Locations: Journal of Applied Physics (publishedVersion)
Topics: Physical Sciences › Engineering › Mechanics of Materials › Thermography and Photoacoustic Techniques
Physical Sciences › Materials Science › Materials Chemistry › Thermal properties of materials
Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Laser-Matter Interactions and Applications
Keywords: thermoreflectance, time-domain thermoreflectance, optical reflectivity, pump-probe spectroscopy, ultrafast laser heating, niobium, rhenium, tantalum, vanadium, aluminum, gold-palladium alloy, optical absorption, surface temperature evolution

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Thermoreflectance of metal transducers for time-domain thermoreflectance

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