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Block Copolymer Lithography

Bates, Christopher M., Maher, Michael J., Janes, Dustin W., Ellison, Christopher J., Willson, C. Grant·2014·Macromolecules
DOI 10.1021/ma401762n
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Abstract

This Perspective addresses the current state of block copolymer lithography and identifies key challenges and opportunities within the field. Significant strides in experimental and theoretical thin film research have nucleated the transition of block copolymers “from lab to fab”, but outstanding questions remain about the optimal materials, processes, and analytical techniques for first-generation devices and beyond. Particular attention herein is focused on advances and issues related to thermal annealing. Block copolymers are poised to change the traditional lithographic resolution enhancement paradigm from “top-down” to “bottom-up”.

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Metadata

Authors
Bates, C. M., Maher, M. J., Janes, D. W., Ellison, C. J., & Willson, C. G.
Venue
Macromolecules
Publisher
American Chemical Society (ACS)
Published
2013-11-07
Volume
47
Issue
1
Pages
2-12
ISSN
  • 0024-9297 (ISSN-L)
  • 1520-5835
DOI
10.1021/ma401762n
OpenAlex
W2324839749
Cited by
634
References
11
FWCI
25.46
Type
journal article
Language
en
Open access
closed

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Bates, C. M., Maher, M. J., Janes, D. W., Ellison, C. J., & Willson, C. G. (2014). Block Copolymer Lithography. Macromolecules. https://doi.org/10.1021/ma401762n

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