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Resistive switching in transition metal oxides

Open access
Sawa, Akihito·2008·Materials Today

Abstract

Rapid advances in information technology rely on high-speed and large-capacity nonvolatile memories. A number of alternatives to contemporary Flash memory have been extensively studied to obtain a more powerful and functional nonvolatile memory. We review the current status of one of the alternatives, resistance random access memory (ReRAM), which uses a resistive switching phenomenon found in transition metal oxides. A ReRAM memory cell is a capacitor-like structure composed of insulating or semiconducting transition metal oxides that exhibits reversible resistive switching on applying voltage pulses. Recent advances in the understanding of the driving mechanism are described in light of experimental results involving memory cells composed of perovskite manganites and titanates.

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Research works printed but not linked: 48

  1. Zhuang, 2002, Tech. Dig. IEDM, 193
  2. Baek, 2004, Tech. Dig. IEDM, 587
  3. Potember, 1979, Appl. Phys. Lett., 34, 405, 10.1063/1.90814 · DOI · Paper page
  4. Müller, 2007, Appl. Phys. Lett., 90, 063503, 10.1063/1.2457342 · doi:10.1063/1.2457342
  5. Ma, 2003, Appl. Phys. Lett., 82, 1419, 10.1063/1.1556555 · DOI · Paper page
  6. Baek, 2005, Tech. Dig. IEDM, 750
  7. Hickmott, 1962, J. Appl. Phys., 33, 2669, 10.1063/1.1702530 · DOI · Paper page
  8. Simmons, 1967, Proc. R. Soc. London, Ser. A, 301, 77, 10.1098/rspa.1967.0191 · DOI · Paper page
  9. Gibbons, 1964, Solid-State Electron., 7, 785, 10.1016/0038-1101(64)90131-5 · DOI · Paper page
  10. Biederman, 1976, Vacuum, 26, 513, 10.1016/S0042-207X(76)81130-X · DOI
  11. Pagnia, 1988, Phys. Status Solidi A, 108, 11, 10.1002/pssa.2211080102 · DOI · Paper page
  12. Asamitsu, 1997, Nature, 388, 50, 10.1038/40363 · DOI · Paper page
  13. Liu, 2000, Appl. Phys. Lett., 76, 2749, 10.1063/1.126464 · DOI · Paper page
  14. Beck, 2000, Appl. Phys. Lett., 77, 139, 10.1063/1.126902 · DOI · Paper page
  15. Watanabe, 2001, Appl. Phys. Lett., 78, 3738, 10.1063/1.1377617 · DOI · Paper page
  16. Baikalov, 2003, Appl. Phys. Lett., 83, 957, 10.1063/1.1590741 · DOI · Paper page
  17. Tsui, 2004, Appl. Phys. Lett., 85, 317, 10.1063/1.1768305 · DOI
  18. Aoyama, 2004, Appl. Phys. Lett., 85, 1208, 10.1063/1.1782268 · doi:10.1063/1.1782268
  19. Sawa, 2004, Appl. Phys. Lett., 85, 4073, 10.1063/1.1812580 · DOI · Paper page
  20. Fujii, 2005, Appl. Phys. Lett., 86, 012107, 10.1063/1.1845598 · DOI · Paper page
  21. Sawa, 2005, Jpn. J. Appl. Phys., 44, L1241, 10.1143/JJAP.44.L1241 · doi:10.1143/jjap.44.l1241
  22. Odagawa, 2004, Phys. Rev. B, 70, 224403, 10.1103/PhysRevB.70.224403 · DOI · Paper page
  23. Chen, 2005, Appl. Phys. Lett., 87, 233506, 10.1063/1.2139843 · DOI
  24. Szot, 2006, Nat. Mater., 5, 312, 10.1038/nmat1614 · DOI · Paper page
  25. Sim, 2005, Tech. Dig. IEDM, 758
  26. Kim, 2006, Appl. Phys. Lett., 88, 202102, 10.1063/1.2204649 · DOI · Paper page
  27. Choi, 2005, J. Appl. Phys., 98, 033715, 10.1063/1.2001146 · DOI · Paper page
  28. Inoue, 2008, Phys. Rev. B, 77, 035105, 10.1103/PhysRevB.77.035105 · DOI · Paper page
  29. Chen, 2005, Tech. Dig. IEDM, 746
  30. Kinoshita, 2006, Appl. Phys. Lett., 89, 103509, 10.1063/1.2339032 · DOI · Paper page
  31. Kim, 2007, Appl. Phys. Lett., 90, 242906, 10.1063/1.2748312 · DOI · Paper page
  32. Ogimoto, 2007, Appl. Phys. Lett., 90, 143515, 10.1063/1.2720747 · DOI
  33. Seong, 2007, Electrochem. Solid-State Lett., 10, H168, 10.1149/1.2718396 · doi:10.1149/1.2718396
  34. Nian, 2007, Phys. Rev. Lett., 98, 146403, 10.1103/PhysRevLett.98.146403 · DOI · Paper page
  35. Sawa, 2005, Proc. SPIE, 5932, 59322C, 10.1117/12.616682 · doi:10.1117/12.616682
  36. Sawa, 2006, Appl. Phys. Lett., 88, 232112, 10.1063/1.2211147 · DOI · Paper page
  37. Fujii, 2007, Phys. Rev. B, 75, 165101, 10.1103/PhysRevB.75.165101 · DOI · Paper page
  38. Schmehl, 2003, Appl. Phys. Lett., 82, 3077, 10.1063/1.1572960 · doi:10.1063/1.1572960
  39. Fors, 2005, Phys. Rev. B, 71, 045305, 10.1103/PhysRevB.71.045305 · DOI · Paper page
  40. Rosenberg, 2004, Phys. Rev. Lett., 92, 178302, 10.1103/PhysRevLett.92.178302 · DOI · Paper page
  41. Rosenberg, 2006, Appl. Phys. Lett., 88, 033510, 10.1063/1.2164917 · DOI
  42. Oka, 2006, Phys. Rev. Lett., 95, 266403, 10.1103/PhysRevLett.95.266403 · DOI
  43. Jeon, 2006, Appl. Phys. Lett., 89, 042904, 10.1063/1.2234840 · DOI
  44. Tomioka, 1996, Phys. Rev. B, 53, R1689, 10.1103/PhysRevB.53.R1689 · DOI
  45. Tomioka, 2004, Phys. Rev. B, 70, 014432, 10.1103/PhysRevB.70.014432 · doi:10.1103/physrevb.70.014432
  46. Tokura, 1993, Phys. Rev. Lett., 70, 2126, 10.1103/PhysRevLett.70.2126 · DOI · Paper page
  47. Tsunoda, 2007, Tech. Dig. IEDM, 767
  48. Muraoka, 2007, Tech. Dig. IEDM, 779

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Metadata

Authors
Sawa, A.
Venue
Materials Today
Publisher
Elsevier BV
Published
2008-06
Volume
11
Issue
6
Pages
28-36
ISSN
1369-7021 (ISSN-L)
OpenAlex
W2048936516
Cited by
2,948
References
4
FWCI
100.71
Type
journal article
Language
en
Open access
hybrid
Licence

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Sawa, A. (2008). Resistive switching in transition metal oxides. Materials Today. https://doi.org/10.1016/s1369-7021(08)70119-6

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